Items where Author is "Ehiasarian, A. P."

Up a level
Export as [feed] Atom [feed] RSS
Group by: Item Type | Full Text | No Grouping
Number of items: 37.

Article

KAMATH, G., EHIASARIAN, A. P., PURANDARE, Y. and HOVSEPIAN, P. (2011). Tribological and oxidation behaviour of TiAlCN/VCN nanoscale multilayer coating deposited by the combined HIPIMS/(HIPIMS-UBM) technique. Surface and Coatings Technology, 205 (8-9), p. 2823.

file
PURANDARE, Y. P., EHIASARIAN, A. P., STACK, M. M. and HOVSEPIAN, P. E. (2010). CrN/NbN coatings deposited by HIPIMS: A preliminary study of erosion-corrosion performance. Surface and coatings technology, 204 (8), 1158-1162.

LEROY, W. P., MAHIEU, S., DEPLA, D. and EHIASARIAN, A. P. (2010). High power impulse magnetron sputtering using a rotating cylindrical magnetron. Journal of Vacuum Science and Technology A, 28 (1), 108-111.

KAMATH, G., EHIASARIAN, A. P. and HOVSEPIAN, P. (2010). Properties of TiAlCN/VCN nanoscale multilayer coatings deposited by mixed high-power impulse magnetron sputtering (HiPIMS) and unbalanced magnetron sputtering processes - impact of HiPIMS during coating. IEEE Transactions on Plasma Science, 38 (11), 3062-3070.

HECIMOVIC, A. and EHIASARIAN, A. P. (2010). Spatial and temporal evolution of ion energies in high power impulse magnetron sputtering plasma discharge. Journal of Applied Physics, 108 (6), 063301.

HOVSEPIAN, P. E., EHIASARIAN, A. P. and RATAYSKI, U. (2009). CrAlYCN/CrCN nanoscale multilayer PVD coatings deposited by the combined High Power Impulse Magnetron Sputtering/Unbalanced Magnetron Sputtering (HIPIMS/UBM) technology. Surface and coatings technology, 203 (9), 1237-1243.

ZHOU, Z. X., ROSS, I. M., RAINFORTH, W. M., CAVALEIRO, A., EHIASARIAN, A. P. and HOVSEPIAN, P. E. (2009). Degradation of a C/CrC PVD coating after annealing in Ar + H-2 at 700 degrees C studied by Raman spectroscopy and transmission electron microscopy. Materials at high temperatures, 26 (2), 169-176.

HOVSEPIAN, P. E., EHIASARIAN, A. P., PURANDARE, Y. P., BRAUN, R. and ROSS, I. M. (2009). Effect of High Ion Irradiation on the Structure, Properties and High Temperature Tribology of Nanoscale CrAlYN/CrN Multilayer Coating Deposited by HIPIMS-HIPIMS Technique. Plasma Processes and Polymers, 6, S118-S123.

YUKIMURA, K. and EHIASARIAN, A. P. (2009). Generation of RF plasma assisted high power pulsed sputtering glow discharge without using a magnetic field. Nuclear Instruments and Methods in Physics Research. Section B-Beam Interactions with Materials and Atoms, 267 (8-9), 1701-1704.

SAFRAN, G., REINHARD, C., EHIASARIAN, A. P., BARNA, P. B., SZEKELY, L., GESZTI, O. and HOVSEPIAN, P. E. (2009). Influence of the bias voltage on the structure and mechanical performance of nanoscale multilayer CrAlYN/CrN physical vapor deposition coatings. Journal of Vacuum Science & Technology A, 27 (2), 174-182.

MACHUNZE, R., EHIASARIAN, A. P., TICHELAAR, F. D. and JANSSEN, G. (2009). Stress and texture in HIPIMS TiN thin films. Thin Solid Films, 518 (5), 1561-1565.

HECIMOVIC,, A. and EHIASARIAN, A. P. (2009). Time evolution of ion energies in HIPIMS of chromium plasma discharge. Journal of Physics D: Applied Physics, 42 (13).

file
PURANDARE, Y. P., EHIASARIAN, A. P. and HOVSEPIAN, P. E. (2008). Deposition of nanoscale multilayer CrN/NbN physical vapor deposition coatings by high power impulse magnetron sputtering. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 26 (2), 288-296.

EHIASARIAN, A. P., VETUSHKA, A., HECIMOVIC, A. and KONSTANTINIDIS, S. (2008). Ion composition produced by high power impulse magnetron sputtering discharges near the substrate. Journal of Applied Physics, 104 (8).

BURCALOVA, K., HECIMOVIC, A. and EHIASARIAN, A. P. (2008). Ion energy distributions and efficiency of sputtering process in HIPIMS system. Journal of Physics D: Applied Physics, 41 (11).

HOVSEPIAN, P. E., EHIASARIAN, A. P., DEEMING, A. and SCHIMPF, C. (2008). Novel TiAlCN/VCN nanoscale multilayer PVD coatings deposited by the combined high-power impulse magnetron sputtering/unbalanced magnetron sputtering (HIPIMS/UBM) technology. Vacuum, 82 (11), 1312-1317.

ANDERSSON, J., EHIASARIAN, A. P. and ANDERS, A. (2008). Observation of Ti4+ ions in a high power impulse magnetron sputtering plasma. Applied Physics Letters, 93 (7).

HECIMOVIC, A., BURCALOVA, K. and EHIASARIAN, A. P. (2008). Origins of ion energy distribution function (IEDF) in high power impulse magnetron sputtering (HIPIMS) plasma discharge. Journal of Physics D: Applied Physics, 41 (9).

VETUSHKA, A. and EHIASARIAN, A. P. (2008). Plasma dynamic in chromium and titanium HIPIMS discharges. Journal of Physics D: Applied Physics, 41 (1).

file
LUO, Q., SCHIMPF, C., EHIASARIAN, A. P., CHEN, L. and HOVSEPIAN, P. (2007). Structure and wear mechanisms of nano-structured TiAlCN/VCN multilayer coatings. Plasma Process and Polymers, 4 (51), S916-S920.

EHIASARIAN, A. P., ANDERS, A. and PETROV, I. (2007). Combined filtered cathodic arc etching pretreatment-magnetron sputter deposition of highly adherent CrN films. Journal of Vacuum Science & Technology A, 25 (3), 543-550.

REINHARD, C., EHIASARIAN, A. P. and HOVSEPIAN, P. E. (2007). CrN/NbN superlattice structured coatings with enhanced corrosion resistance achieved by high power impulse magnetron sputtering interface pre-treatment. Thin Solid Films, 515 (7-8), 3685-3692.

ANDERS, A., ANDERSSON, J. and EHIASARIAN, A. P. (2007). High power impulse magnetron sputtering: Current-voltage-time characteristics indicate the onset of sustained self-sputtering. Journal of Applied Physics, 102 (11).

HOVSEPIAN, P. E., REINHARD, C. and EHIASARIAN, A. P. (2006). CrAlYN/CrN superlattice coatings deposited by the combined high power impulse magnetron sputtering/unbalanced magnetron sputtering technique. Surface and Coatings Technology, 201 (7), 4105-4110.

LATTEMANN, M., EHIASARIAN, A. P., BOHMARK, J., PERSSON, P. A. O. and HELMERSSON, U. (2006). Investigation of high power impulse magnetron sputtering pretreated interfaces for adhesion enhancement of hard coatings on steel. Surface and Coatings Technology, 200 (22-23), 6495-6499.

HELMERSSON, U., LATTEMANN, M., BOHLMARK, J., EHIASARIAN, A. P. and GUDMUNDSSON, J. T. (2006). Ionized physical vapor deposition (IPVD): A review of technology and applications. Thin Solid Films, 513 (1-2), 1-24.

VAN ESSEN, P., HOY, R., KAMMING, J. D., EHIASARIAN, A. P. and JANSSEN, G. (2006). Scratch resistance and wear of CrNx coatings. Surface and Coatings Technology, 200 (11), 3496-3502.

BOHLMARK, J., LATTEMANN, M., GUDMUNDSSON, J. T., EHIASARIAN, A. P., GONZALVO, Y. A., BRENNING, N. and HELMERSSON, U. (2006). The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge. Thin Solid Films, 515 (4), 1522-1526.

LEWIS, D. B., CREASEY, S. J., WUSTEFELD, C., EHIASARIAN, A. P. and HOVSEPIAN, P. E. (2006). The role of the growth defects on the corrosion resistance of CrN/NbN superlattice coatings deposited at low temperatures. Thin Solid Films, 503 (1-2), 143-148.

BOHLMARK, J., ALAMI, J., CHRISTOU, C., EHIASARIAN, A. P. and HELMERSSON, U. (2005). Ionization of sputtered metals in high power pulsed magnetron sputtering. Journal of Vacuum Science & Technology A, 23 (1), 18-22.

ZHOU, Z. X., RAINFORTH, W. M., ROTHER, B., EHIASARIAN, A. P., HOVSEPIAN, P. E. and MUNZ, W. D. (2004). Elemental distributions and substrate rotation in industrial TiAlN/VN superlattice hard PVD coatings. Surface and Coatings Technology, 183 (2-3), 275-282.

EHIASARIAN, A. P., HOVSEPIAN, P. E., NEW, R. and VALTER, J. (2004). Influence of steering magnetic field on the time-resolved plasma chemistry in cathodic arc discharges. Journal of Physics D: Applied Physics, 37 (15), 2101-2106.

ZHOU, Z., RAINFORTH, W. M., LEWIS, D. B., CREASY, S., FORSYTH, J. J., CLEGG, E., EHIASARIAN, A. P., HOVSEPIAN, P. E. and MUNZ, W. D. (2004). Oxidation behaviour of nanoscale TiAlN/VN multilayer coatings. Surface and Coatings Technology, 177, 198-203.

HOVSEPIAN, P. E., KOK, Y. N., EHIASARIAN, A. P., ERDEMIR, A., WEN, J. G. and PETROV, I. (2004). Structure and tribological behaviour of nanoscale multilayer C/Cr coatings deposited by the combined steered cathodic arc/unbalanced magnetron sputtering technique. Thin Solid Films, 447, 7-13.

file
LEWIS, D. B., CREASEY, S. J., ZHOU, Z., FORSYTH, J. J., EHIASARIAN, A. P., HOVSEPIAN, P. E., LUO, Q., RAINFORTH, W. M. and MUNZ, W. D. (2003). The effect of (Ti + Al): V ratio on the structure and oxidation behaviour of TiAlN/VN nano-scale multilayer coatings. Surface and coatings technology, 177, 252-259.

MUNZ, W. D., LEWIS, D. B., HOVSEPIAN, P. E., SCHONJAHN, C., EHIASARIAN, A. P. and SMITH, I. J. (2001). Industrial scale manufactured superlattice hard PVD coatings. Surface Engineering, 17 (1), 15-27.

Book Section

NAYAL, G., EHIASARIAN, A. P., MACAK, K. M., NEW, R., MUNZ, W. D. and SMITH, I. J. (2001). A new low pressure plasma nitriding and PVD coating duplex treatment of HSS substrates. In: Progress in plasma processing of materials 2001. Begell House, 565-572.

This list was generated on Thu Apr 25 12:35:30 2024 UTC.