Items where Author is "Ehiasarian, A. P."

PURANDARE, Y. P., EHIASARIAN, A. P., STACK, M. M. and HOVSEPIAN, P. E. (2010). CrN/NbN coatings deposited by HIPIMS: A preliminary study of erosion-corrosion performance. Surface and coatings technology, 204 (8), 1158-1162. [Article]

PURANDARE, Y. P., EHIASARIAN, A. P. and HOVSEPIAN, P. E. (2008). Deposition of nanoscale multilayer CrN/NbN physical vapor deposition coatings by high power impulse magnetron sputtering. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 26 (2), 288-296. [Article]

LUO, Q., SCHIMPF, C., EHIASARIAN, A. P., CHEN, L. and HOVSEPIAN, P. (2007). Structure and wear mechanisms of nano-structured TiAlCN/VCN multilayer coatings. Plasma Process and Polymers, 4 (51), S916-S920. [Article]

LEWIS, D. B., CREASEY, S. J., ZHOU, Z., FORSYTH, J. J., EHIASARIAN, A. P., HOVSEPIAN, P. E., LUO, Q., RAINFORTH, W. M. and MUNZ, W. D. (2003). The effect of (Ti + Al): V ratio on the structure and oxidation behaviour of TiAlN/VN nano-scale multilayer coatings. Surface and coatings technology, 177, 252-259. [Article]

KAMATH, G., EHIASARIAN, A. P., PURANDARE, Y. and HOVSEPIAN, P. (2011). Tribological and oxidation behaviour of TiAlCN/VCN nanoscale multilayer coating deposited by the combined HIPIMS/(HIPIMS-UBM) technique. Surface and Coatings Technology, 205 (8-9), p. 2823. [Article]

LEROY, W. P., MAHIEU, S., DEPLA, D. and EHIASARIAN, A. P. (2010). High power impulse magnetron sputtering using a rotating cylindrical magnetron. Journal of Vacuum Science and Technology A, 28 (1), 108-111. [Article]

KAMATH, G., EHIASARIAN, A. P. and HOVSEPIAN, P. (2010). Properties of TiAlCN/VCN nanoscale multilayer coatings deposited by mixed high-power impulse magnetron sputtering (HiPIMS) and unbalanced magnetron sputtering processes - impact of HiPIMS during coating. IEEE Transactions on Plasma Science, 38 (11), 3062-3070. [Article]

HECIMOVIC, A. and EHIASARIAN, A. P. (2010). Spatial and temporal evolution of ion energies in high power impulse magnetron sputtering plasma discharge. Journal of Applied Physics, 108 (6), 063301. [Article]

HOVSEPIAN, P. E., EHIASARIAN, A. P. and RATAYSKI, U. (2009). CrAlYCN/CrCN nanoscale multilayer PVD coatings deposited by the combined High Power Impulse Magnetron Sputtering/Unbalanced Magnetron Sputtering (HIPIMS/UBM) technology. Surface and coatings technology, 203 (9), 1237-1243. [Article]

ZHOU, Z. X., ROSS, I. M., RAINFORTH, W. M., CAVALEIRO, A., EHIASARIAN, A. P. and HOVSEPIAN, P. E. (2009). Degradation of a C/CrC PVD coating after annealing in Ar + H-2 at 700 degrees C studied by Raman spectroscopy and transmission electron microscopy. Materials at high temperatures, 26 (2), 169-176. [Article]

HOVSEPIAN, P. E., EHIASARIAN, A. P., PURANDARE, Y. P., BRAUN, R. and ROSS, I. M. (2009). Effect of High Ion Irradiation on the Structure, Properties and High Temperature Tribology of Nanoscale CrAlYN/CrN Multilayer Coating Deposited by HIPIMS-HIPIMS Technique. Plasma Processes and Polymers, 6, S118-S123. [Article]

YUKIMURA, K. and EHIASARIAN, A. P. (2009). Generation of RF plasma assisted high power pulsed sputtering glow discharge without using a magnetic field. Nuclear Instruments and Methods in Physics Research. Section B-Beam Interactions with Materials and Atoms, 267 (8-9), 1701-1704. [Article]

SAFRAN, G., REINHARD, C., EHIASARIAN, A. P., BARNA, P. B., SZEKELY, L., GESZTI, O. and HOVSEPIAN, P. E. (2009). Influence of the bias voltage on the structure and mechanical performance of nanoscale multilayer CrAlYN/CrN physical vapor deposition coatings. Journal of Vacuum Science & Technology A, 27 (2), 174-182. [Article]

MACHUNZE, R., EHIASARIAN, A. P., TICHELAAR, F. D. and JANSSEN, G. (2009). Stress and texture in HIPIMS TiN thin films. Thin Solid Films, 518 (5), 1561-1565. [Article]

HECIMOVIC,, A. and EHIASARIAN, A. P. (2009). Time evolution of ion energies in HIPIMS of chromium plasma discharge. Journal of Physics D: Applied Physics, 42 (13). [Article]

EHIASARIAN, A. P., VETUSHKA, A., HECIMOVIC, A. and KONSTANTINIDIS, S. (2008). Ion composition produced by high power impulse magnetron sputtering discharges near the substrate. Journal of Applied Physics, 104 (8). [Article]

BURCALOVA, K., HECIMOVIC, A. and EHIASARIAN, A. P. (2008). Ion energy distributions and efficiency of sputtering process in HIPIMS system. Journal of Physics D: Applied Physics, 41 (11). [Article]

HOVSEPIAN, P. E., EHIASARIAN, A. P., DEEMING, A. and SCHIMPF, C. (2008). Novel TiAlCN/VCN nanoscale multilayer PVD coatings deposited by the combined high-power impulse magnetron sputtering/unbalanced magnetron sputtering (HIPIMS/UBM) technology. Vacuum, 82 (11), 1312-1317. [Article]

ANDERSSON, J., EHIASARIAN, A. P. and ANDERS, A. (2008). Observation of Ti4+ ions in a high power impulse magnetron sputtering plasma. Applied Physics Letters, 93 (7). [Article]

HECIMOVIC, A., BURCALOVA, K. and EHIASARIAN, A. P. (2008). Origins of ion energy distribution function (IEDF) in high power impulse magnetron sputtering (HIPIMS) plasma discharge. Journal of Physics D: Applied Physics, 41 (9). [Article]

VETUSHKA, A. and EHIASARIAN, A. P. (2008). Plasma dynamic in chromium and titanium HIPIMS discharges. Journal of Physics D: Applied Physics, 41 (1). [Article]

EHIASARIAN, A. P., ANDERS, A. and PETROV, I. (2007). Combined filtered cathodic arc etching pretreatment-magnetron sputter deposition of highly adherent CrN films. Journal of Vacuum Science & Technology A, 25 (3), 543-550. [Article]

REINHARD, C., EHIASARIAN, A. P. and HOVSEPIAN, P. E. (2007). CrN/NbN superlattice structured coatings with enhanced corrosion resistance achieved by high power impulse magnetron sputtering interface pre-treatment. Thin Solid Films, 515 (7-8), 3685-3692. [Article]

ANDERS, A., ANDERSSON, J. and EHIASARIAN, A. P. (2007). High power impulse magnetron sputtering: Current-voltage-time characteristics indicate the onset of sustained self-sputtering. Journal of Applied Physics, 102 (11). [Article]

HOVSEPIAN, P. E., REINHARD, C. and EHIASARIAN, A. P. (2006). CrAlYN/CrN superlattice coatings deposited by the combined high power impulse magnetron sputtering/unbalanced magnetron sputtering technique. Surface and Coatings Technology, 201 (7), 4105-4110. [Article]

LATTEMANN, M., EHIASARIAN, A. P., BOHMARK, J., PERSSON, P. A. O. and HELMERSSON, U. (2006). Investigation of high power impulse magnetron sputtering pretreated interfaces for adhesion enhancement of hard coatings on steel. Surface and Coatings Technology, 200 (22-23), 6495-6499. [Article]

HELMERSSON, U., LATTEMANN, M., BOHLMARK, J., EHIASARIAN, A. P. and GUDMUNDSSON, J. T. (2006). Ionized physical vapor deposition (IPVD): A review of technology and applications. Thin Solid Films, 513 (1-2), 1-24. [Article]

VAN ESSEN, P., HOY, R., KAMMING, J. D., EHIASARIAN, A. P. and JANSSEN, G. (2006). Scratch resistance and wear of CrNx coatings. Surface and Coatings Technology, 200 (11), 3496-3502. [Article]

BOHLMARK, J., LATTEMANN, M., GUDMUNDSSON, J. T., EHIASARIAN, A. P., GONZALVO, Y. A., BRENNING, N. and HELMERSSON, U. (2006). The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge. Thin Solid Films, 515 (4), 1522-1526. [Article]

LEWIS, D. B., CREASEY, S. J., WUSTEFELD, C., EHIASARIAN, A. P. and HOVSEPIAN, P. E. (2006). The role of the growth defects on the corrosion resistance of CrN/NbN superlattice coatings deposited at low temperatures. Thin Solid Films, 503 (1-2), 143-148. [Article]

BOHLMARK, J., ALAMI, J., CHRISTOU, C., EHIASARIAN, A. P. and HELMERSSON, U. (2005). Ionization of sputtered metals in high power pulsed magnetron sputtering. Journal of Vacuum Science & Technology A, 23 (1), 18-22. [Article]

ZHOU, Z. X., RAINFORTH, W. M., ROTHER, B., EHIASARIAN, A. P., HOVSEPIAN, P. E. and MUNZ, W. D. (2004). Elemental distributions and substrate rotation in industrial TiAlN/VN superlattice hard PVD coatings. Surface and Coatings Technology, 183 (2-3), 275-282. [Article]

EHIASARIAN, A. P., HOVSEPIAN, P. E., NEW, R. and VALTER, J. (2004). Influence of steering magnetic field on the time-resolved plasma chemistry in cathodic arc discharges. Journal of Physics D: Applied Physics, 37 (15), 2101-2106. [Article]

ZHOU, Z., RAINFORTH, W. M., LEWIS, D. B., CREASY, S., FORSYTH, J. J., CLEGG, E., EHIASARIAN, A. P., HOVSEPIAN, P. E. and MUNZ, W. D. (2004). Oxidation behaviour of nanoscale TiAlN/VN multilayer coatings. Surface and Coatings Technology, 177, 198-203. [Article]

HOVSEPIAN, P. E., KOK, Y. N., EHIASARIAN, A. P., ERDEMIR, A., WEN, J. G. and PETROV, I. (2004). Structure and tribological behaviour of nanoscale multilayer C/Cr coatings deposited by the combined steered cathodic arc/unbalanced magnetron sputtering technique. Thin Solid Films, 447, 7-13. [Article]

MUNZ, W. D., LEWIS, D. B., HOVSEPIAN, P. E., SCHONJAHN, C., EHIASARIAN, A. P. and SMITH, I. J. (2001). Industrial scale manufactured superlattice hard PVD coatings. Surface Engineering, 17 (1), 15-27. [Article]

NAYAL, G., EHIASARIAN, A. P., MACAK, K. M., NEW, R., MUNZ, W. D. and SMITH, I. J. (2001). A new low pressure plasma nitriding and PVD coating duplex treatment of HSS substrates. In: Progress in plasma processing of materials 2001. Begell House, 565-572. [Book Section]