Items where Author is "Loch, Daniel"

SHUKLA, Krishnanand, PURANDARE, Yashodhan, SUGUMARAN, Arunprabhu, LOCH, Daniel, EHIASARIAN, Arutiun, KHAN, Imran and HOVSEPIAN, Papken (2021). A new approach towards performing plasma nitriding of CrCoMo medical grade alloys using HIPIMS discharge. 64th Annual Technical Conference Proceedings. [Article]

BOWER, Ryan, LOCH, Daniel, WARE, Ecaterina, BERENOV, Andrey, ZOU, Bin, HOVSEPIAN, Papken, EHIASARIAN, Arutiun and PETROV, Peter (2020). Complimentary Metal-Oxide-Semiconductor compatible deposition of nanoscale transition-metal nitride thin films for plasmonic applications. ACS Applied Materials and Interfaces. [Article]

BISWAS, Barnali, PURANDARE, Yashodhan, ARUNACHALAMSUGUMARAN, Arunprabhu, LOCH, Daniel, CREASY, Stuart, KHAN, Imran, EHIASARIAN, Arutiun and HOVSEPIAN, Papken (2017). Defect growth in multilayer chromium nitride/niobium nitride coatings produced by combined high power impulse magnetron sputtering and unbalance magnetron sputtering technique. Thin Solid Films, 636, 558-566. [Article]

LOCH, Daniel, ARANDA GONZALVO, Yolanda and EHIASARIAN, Arutiun (2017). Plasma analysis of Inductively Coupled Impulse Sputtering of Cu, Ti and Ni. Plasma Sources Science and Technology, 26 (6). [Article]

LOCH, Daniel and EHIASARIAN, Arutiun (2016). Study of the Effect of RF-power and process pressure on the morphology of copper and titanium sputtered by ICIS. Surface and coatings technology, 327, 200-206. [Article]

HOVSEPIAN, Papken, ARUNACHALAMSUGUMARAN, Arunprabhu, PURANDARE, Yashodhan, LOCH, Daniel and EHIASARIAN, Arutiun (2014). Effect of the degree of high power impulse magnetron sputtering utilisation on the structure and properties of TiN films. Thin Solid Films, 562, 132-139. [Article]

LEWIN, Erik, LOCH, Daniel, MONTAGNE, Alex, EHIASARIAN, Arutiun P. and PATSCHEIDER, Jörg (2013). Comparison of Al–Si–N nanocomposite coatings deposited by HIPIMS and DC magnetron sputtering. Surface and coatings technology, 232, 680-689. [Article]

LOCH, Daniel and EHIASARIAN, Arutiun (2012). A novel sputtering technique: Inductively Coupled Impulse Sputtering (ICIS). IOP Conference Series: Materials Science and Engineering, 39 (012006). [Article]

SHUKLA, Krishnanand, PURANDARE, Yashodhan, LOCH, Daniel, SUGUMARAN, Arrunprabhu, KAHN, Imran, EHIASARIAN, Arutiun and HOVSEPIAN, Papken (2020). Low-Pressure Plasma Nitriding Of Medical Grade Alloy Using HIPIMS Discharge. In: I2RI Winter Poster Session, Virtual, 09 December 2020. (Unpublished) [Conference or Workshop Item]