New method of vapour discrimination using the thickness shear mode (TSM) resonator

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HOLLOWAY, A., NABOK, A. V., THOMPSON, M., RAY, A. K., CROWTHER, D. and SIDDIQI, J. (2003). New method of vapour discrimination using the thickness shear mode (TSM) resonator. Sensors, 3 (6), 187-191. [Article]

Abstract

The impedance analysis technique complemented with curve fitting software was used to monitor changes in film properties of Thickness Shear Mode (TSM) resonator on vapour exposure. The approach demonstrates how sensor selectivity can be achieved through unique changes in film viscosity caused by organic vapour adsorption.

More Information
Official URL:
http://www.mdpi.org/sensors/papers/s30600187.pdf
Research Institute, Centre or Group - Does NOT include content added after October 2018:
Materials and Engineering Research Institute > Modelling Research Centre > Microsystems and Machine Vision Laboratory
Page Range:
187-191

Identifiers

ORCID:
https://orcid.org/0000-0003-1189-1198https://orcid.org/0000-0002-9078-1757

Library

Item Type:
Article
Depositing User:
Ann Betterton
Date Deposited:
10 Mar 2008
Last Modified:
18 Mar 2021 21:45
URI:
https://shura.shu.ac.uk/id/eprint/388
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