Items where Author is "Ehiasarian, A.P."

EHIASARIAN, A.P. and HOVSEPIAN, P. Eh (2024). Novel high-efficiency plasma nitriding process utilizing a high power impulse magnetron sputtering discharge. Journal of Vacuum Science & Technology A, 42 (2). [Article]

PURANDARE, Yashodhan, ROBINSON, G.L., EHIASARIAN, A.P. and HOVSEPIAN, P. Eh (2020). Investigation of High Power Impulse Magnetron Sputtering deposited nanoscale CrN/NbN multilayer coating for tribocorrosion resistance. Wear, p. 203312. [Article]

GAJEWSKI, W., EHIASARIAN, A.P., ŻELECHOWSKI, M. and HOVSEPIAN, P. Eh. (2017). Composition and dynamics of high power impulse magnetron discharge at W-Mo-C target in argon atmosphere. Surface and Coatings Technology, 327, 185-191. [Article]

SUGUMARAN, A.A., PURANDARE, Yashodhan, MANDAL, P., EHIASARIAN, A.P. and HOVSEPIAN, Papken (2013). Effect of the degree of high power impulse magnetron sputtering (HIPIMS) utilisation on the corrosion properties of TiN films. In: Society of Vacuum Coaters 505/856-7188. 56th Annual Technical Conference Proceedings,. Society of Vacuum Coaters. [Book Section]