Electrical and structural characteristics of yttrium oxide films deposited by rf-magnetron sputtering on n-Si

EVANGELOU, E. K., WIEMER, C., FANCIULLI, M., SETHU, M. and CRANTON, Wayne (2003). Electrical and structural characteristics of yttrium oxide films deposited by rf-magnetron sputtering on n-Si. Journal of Applied Physics, 94 (1), 318-325. [Article]

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