Chapter 2: fundamentals and applications of HIPIMS

EHIASARIAN, Arutiun (2008). Chapter 2: fundamentals and applications of HIPIMS. In: WEI, Ronghua, (ed.) Plasma Surface Engineering Research and its Practical Applications. Kerala, Research Signpost, 35-87.

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Abstract

High Power Impulse Magnetron Sputtering (HIPIMS) has been introduced in the late 1990s as a unique physical vapor deposition method. The technology utilizes magnetron sputtering cathodes and high peak power density of 3 kWcm-2 on the target. The plasma produces a metal flux with high degree of ionization. HIPIMS has been successfully used as a substrate pretreatment method to enhance coating adhesion by promoting local epitaxial growth. As a deposition technology, HIPIMS produces high density microstructure films. It has been industrialized and has successful applications in hard coatings, electronic coatings and optical coatings.

Item Type:	Book Section
Uncontrolled Keywords:	HIPIMS; High Power Impulse Magnetron Sputtering; Thin Films
Page Range:	35-87
SWORD Depositor:	Symplectic Elements
Depositing User:	Symplectic Elements
Date Deposited:	07 Feb 2023 16:42
Last Modified:	11 Oct 2023 17:31
URI:	https://shura.shu.ac.uk/id/eprint/28759

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