KRISHNANAND, Shukla, ARUNACHALAM SUGUMARAN, Arunprabhu, KHAN, Imran, EHIASARIAN, Arutiun and HOVSEPIAN, Papken (2020). Low pressure plasma nitrided CoCrMo alloy utilising HIPIMS discharge for biomedical applications. Journal of The Mechanical Behavior of Biomedical Materials. [Article]
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JMBBM_Revised_Paper 1_clean.pdf - Accepted Version
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JMBBM_Revised_Paper 1_clean.pdf - Accepted Version
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Abstract
CoCrMo is a biomedical grade alloy which is widely used in the manufacturing of orthopaedic
implants such as hip and knee replacement joints because of it has high hardness, high
corrosion resistance, and excellent biocompatibility. However, the release of metal ions due to
corrosion and wear of the alloy over time may cause allergic or other adverse reactions in some
patients. To date, various surface modification techniques including nitriding, have been used
to improve the performance of CoCrMo (F75) alloy.
In the current work, a new low-pressure plasma nitriding process is described. Unlike
conventional plasma nitriding, the process utilises High Power Impulse Magnetron Sputtering
(HIPIMS) discharge, sustained on one Cr target at low power, to further enhance the ionisation
of the gas in the vacuum chamber and to avoid coating deposition. The nitriding of CoCrMo
alloy has been carried out in a wide range of nitriding voltages (from -500 V to -1100 V) at
400 °C for duration of 4 hours. The chemical and phase composition of the nitrided layer has
been studied by various advanced surface analyses techniques.
The X-ray diffraction data of all the nitrided samples revealed the formation of
expanded austenite (γN) phase. Texture analyses revealed that at lower nitriding voltages
(-700 V) the predominant crystallographic orientation of the compound layer is (200)
whereas at higher voltages (-900 V to -1100 V) the layer develops mixed (111) and (200)
texture. For samples nitrided at a lower bias voltage of - 500 V, diffraction peaks for
CrN/NbN and Cr2N were also observed due to the deposition of target materials (Cr and
Nb). However, no coating deposition on the substrate surface was observed at higher bias
voltages (-700 V and higher) due to sufficient re-sputtering effect. The results obtained
from glow discharge optical emission spectroscopy (GDOES) depth profiling showed that
the depth of nitriding increased from approximately 0.7 µm at -500 V to 6 µm at -1100 V.
In the pin-on-disc tribological test nitrided samples showed low coefficient of friction µ in
the range of 0.6 to 0.7, compared to µ= 0.8 recorded for the untreated substrate. The wear
coefficients (Kc) were found to be between 1.79 × 10-15 m3N
-1m-1
(-700 V) and 4.62 × 10-
15 m3N
-1m-1
(-1100 V), which were one order of magnitude lower than the untreated
substrate, Kc = 6 ×10-14 m3N
-1m-1
. The Knoop microhardness (HK) of nitrided samples
significantly increased by a factor of 5 (HK= 2750 at -1100 V) as compared to the untreated
substrate, HK=525, demonstrating the high efficiency of the process. The samples nitrided
at -700 V and - 900 V exhibited enhanced corrosion resistance as compared to untreated
alloy by avoiding the formation of CrN based compounds which adversely affect the
corrosion performance.
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