SiGeSn growth studies using reduced pressure chemical vapor deposition towards optoelectronic applications

WIRTHS, S., BUCA, D., IKONIC, Z., HARRISON, Paul, TIEDEMANN, A. T., HOLLÄNDER, B., STOICA, T., MUSSLER, G., BREUER, U., HARTMANN, J. M., GRÜTZMACHER, D. and MANTL, S. (2014). SiGeSn growth studies using reduced pressure chemical vapor deposition towards optoelectronic applications. Thin Solid Films, 557, 183-187.

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Abstract

In this contribution, we propose a laser concept based on a double heterostructure consisting of tensile strained Ge as the active medium and SiGeSn ternaries as cladding layers. Electronic band-structure calculations were used to determine the Si and Sn concentrations yielding a type I heterostructure with appropriate band-offsets (50meV) between strained Ge and SiGeSn. Reduced pressure chemical vapor deposition system was employed to study the laser structure growth. Detailed analyses regarding layer composition, crystal quality, surface morphology and elastic strain are presented. A strong temperature dependence of the Si and Sn incorporation has been obtained, ranging from 4 to 19 at.% Si and from 4 to 12 at.% Sn (growth temperatures between 350 °C and 475°C). The high single crystalline quality and lowsurface roughness of 0.5–0.75nmdemonstrate that our layers are suitable for heterostructure laser fabrication.

Item Type:	Article
Research Institute, Centre or Group - Does NOT include content added after October 2018:	Materials and Engineering Research Institute > Advanced Coatings and Composites Research Centre > Electronic Materials and Sensors Research Group
Identification Number:	https://doi.org/10.1016/j.tsf.2013.10.078
Page Range:	183-187
Depositing User:	Paul Harrison
Date Deposited:	19 Sep 2014 14:44
Last Modified:	18 Mar 2021 04:37
URI:	https://shura.shu.ac.uk/id/eprint/8422

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