Electrical and structural characteristics of yttrium oxide films deposited by rf-magnetron sputtering on n-Si

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EVANGELOU, E. K., WIEMER, C., FANCIULLI, M., SETHU, M. and CRANTON, Wayne (2003). Electrical and structural characteristics of yttrium oxide films deposited by rf-magnetron sputtering on n-Si. Journal of Applied Physics, 94 (1), 318-325. [Article]

More Information
Official URL:
http://scitation.aip.org/content/aip/journal/jap/9...
Additional Information:
Cited By (since 1996):42 ID=184
Research Institute, Centre or Group - Does NOT include content added after October 2018:
Materials and Engineering Research Institute > Engineering Research
Materials and Engineering Research Institute > Advanced Coatings and Composites Research Centre > Electronic Materials and Sensors Research Group
Page Range:
318-325

Identifiers

Identification Number:
10.1063/1.1580644
ORCID:
https://orcid.org/0000-0002-0142-7810

Library

Item Type:
Article
Depositing User:
Wayne Cranton
Date Deposited:
01 Jun 2016 12:43
Last Modified:
18 Mar 2021 19:15
URI:
https://shura.shu.ac.uk/id/eprint/8013
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