Distance-dependent plasma composition and ion energy in high power impulse magnetron sputtering

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EHIASARIAN, Arutiun, ANDERSSON, Joakim and ANDERS, André (2010). Distance-dependent plasma composition and ion energy in high power impulse magnetron sputtering. Journal of Physics D: Applied Physics, 43 (27), p. 275204. [Article]

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Research Institute, Centre or Group - Does NOT include content added after October 2018:
Materials and Engineering Research Institute > Advanced Coatings and Composites Research Centre > Nanotechnology Centre for PVD Research
Page Range:
p. 275204

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Identification Number:
10.1088/0022-3727/43/27/275204
ORCID:
https://orcid.org/0000-0001-6080-3946

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Item Type:
Article
Depositing User:
Ann Betterton
Date Deposited:
12 Jul 2010 14:25
Last Modified:
18 Mar 2021 21:15
URI:
https://shura.shu.ac.uk/id/eprint/2329
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