Browse by Journals

[up]

Group by: Creators | Date | Item Type | Full Text Status | No Grouping

Jump to: Public

Number of items: 1.

Public

file

LOCH, Daniel, ARANDA GONZALVO, Yolanda and EHIASARIAN, Arutiun (2017). Plasma analysis of Inductively Coupled Impulse Sputtering of Cu, Ti and Ni. Plasma Sources Science and Technology, 26 (6). [Article]

This list was generated on Thu Nov 21 19:09:34 2024 UTC.