Browse by Journals

[up]

Group by: Creators | Date | Item Type | Full Text Status | No Grouping

Jump to: B | E | P | S

Number of items: 6.

B

BOHLMARK, J., ALAMI, J., CHRISTOU, C., EHIASARIAN, A. P. and HELMERSSON, U. (2005). Ionization of sputtered metals in high power pulsed magnetron sputtering. Journal of Vacuum Science & Technology A, 23 (1), 18-22. [Article]

E

EHIASARIAN, A. P., ANDERS, A. and PETROV, I. (2007). Combined filtered cathodic arc etching pretreatment-magnetron sputter deposition of highly adherent CrN films. Journal of Vacuum Science & Technology A, 25 (3), 543-550. [Article]

P

file

file

file

PURANDARE, Yashodhan, EHIASARIAN, Arutiun and HOVSEPIAN, Papken (2016). Target poisoning during CrN deposition by mixed high power impulse magnetron sputtering and unbalanced magnetron sputtering technique. Journal of Vacuum Science & Technology A, 34 (4), 041502-1. [Article]

file

PURANDARE, Yashodhan, EHIASARIAN, Arutiun, SANTANA, Antonio and HOVSEPIAN, Papken (2014). ZrN coatings deposited by high power impulse magnetron sputtering and cathodic arc techniques. Journal of Vacuum Science & Technology A, 32 (3). [Article]

S

SAFRAN, G., REINHARD, C., EHIASARIAN, A. P., BARNA, P. B., SZEKELY, L., GESZTI, O. and HOVSEPIAN, P. E. (2009). Influence of the bias voltage on the structure and mechanical performance of nanoscale multilayer CrAlYN/CrN physical vapor deposition coatings. Journal of Vacuum Science & Technology A, 27 (2), 174-182. [Article]

SCHONJAHN, C., EHIASARIAN, Arutiun, LEWIS, D. B., NEW, R., MUNZ, W. D., TWESTEN, R. D. and PETROV, I. (2001). Optimization of in situ substrate surface treatment in a cathodic arc plasma: A study by TEM and plasma diagnostics. Journal of Vacuum Science & Technology A, 19 (4), 1415-1420. [Article]

This list was generated on Wed Nov 27 04:25:33 2024 UTC.