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Group by: Creators | Date | Item Type | Full Text Status | No Grouping

Jump to: 2016 | 2014 | 2009 | 2007 | 2005 | 2001

Number of items: 6.

2016

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PURANDARE, Yashodhan, EHIASARIAN, Arutiun and HOVSEPIAN, Papken (2016). Target poisoning during CrN deposition by mixed high power impulse magnetron sputtering and unbalanced magnetron sputtering technique. Journal of Vacuum Science & Technology A, 34 (4), 041502-1. [Article]

2014

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PURANDARE, Yashodhan, EHIASARIAN, Arutiun, SANTANA, Antonio and HOVSEPIAN, Papken (2014). ZrN coatings deposited by high power impulse magnetron sputtering and cathodic arc techniques. Journal of Vacuum Science & Technology A, 32 (3). [Article]

2009

SAFRAN, G., REINHARD, C., EHIASARIAN, A. P., BARNA, P. B., SZEKELY, L., GESZTI, O. and HOVSEPIAN, P. E. (2009). Influence of the bias voltage on the structure and mechanical performance of nanoscale multilayer CrAlYN/CrN physical vapor deposition coatings. Journal of Vacuum Science & Technology A, 27 (2), 174-182. [Article]

2007

EHIASARIAN, A. P., ANDERS, A. and PETROV, I. (2007). Combined filtered cathodic arc etching pretreatment-magnetron sputter deposition of highly adherent CrN films. Journal of Vacuum Science & Technology A, 25 (3), 543-550. [Article]

2005

BOHLMARK, J., ALAMI, J., CHRISTOU, C., EHIASARIAN, A. P. and HELMERSSON, U. (2005). Ionization of sputtered metals in high power pulsed magnetron sputtering. Journal of Vacuum Science & Technology A, 23 (1), 18-22. [Article]

2001

SCHONJAHN, C., EHIASARIAN, Arutiun, LEWIS, D. B., NEW, R., MUNZ, W. D., TWESTEN, R. D. and PETROV, I. (2001). Optimization of in situ substrate surface treatment in a cathodic arc plasma: A study by TEM and plasma diagnostics. Journal of Vacuum Science & Technology A, 19 (4), 1415-1420. [Article]

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