Items where Author is "Helmersson, U."

LATTEMANN, M., EHIASARIAN, A. P., BOHMARK, J., PERSSON, P. A. O. and HELMERSSON, U. (2006). Investigation of high power impulse magnetron sputtering pretreated interfaces for adhesion enhancement of hard coatings on steel. Surface and Coatings Technology, 200 (22-23), 6495-6499.

HELMERSSON, U., LATTEMANN, M., BOHLMARK, J., EHIASARIAN, A. P. and GUDMUNDSSON, J. T. (2006). Ionized physical vapor deposition (IPVD): A review of technology and applications. Thin Solid Films, 513 (1-2), 1-24.

BOHLMARK, J., LATTEMANN, M., GUDMUNDSSON, J. T., EHIASARIAN, A. P., GONZALVO, Y. A., BRENNING, N. and HELMERSSON, U. (2006). The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge. Thin Solid Films, 515 (4), 1522-1526.

BOHLMARK, J., ALAMI, J., CHRISTOU, C., EHIASARIAN, A. P. and HELMERSSON, U. (2005). Ionization of sputtered metals in high power pulsed magnetron sputtering. Journal of Vacuum Science & Technology A, 23 (1), 18-22.

EHIASARIAN, Arutiun, HOVSEPIAN, Papken, HULTMAN, L. and HELMERSSON, U. (2004). Comparison of microstructure and mechanical properties of chromium nitride-based coatings deposited by high power impulse magnetron sputtering and by the combined steered cathodic arc/unbalanced magnetron technique. Thin solid films, 457 (2), 270-277.

EHIASARIAN, Arutiun, MUNZ, W. D., HULTMAN, L., HELMERSSON, U. and PETROV, I. (2003). High power pulsed magnetron sputtered CrNx films. Surface and coatings technology, 163-16, 267-272.

EHIASARIAN, Arutiun, MUNZ, W. D., HULTMAN, L., HELMERSSON, U., PETROV, I. and SEITZ, Frederick (2003). High power pulsed magnetron sputtered CrNx films. Galvanotechnik, 94 (6), 1480-1487.

EHIASARIAN, Arutiun, NEW, Roger, MUNZ, W. D., HULTMAN, L., HELMERSSON, U. and KOUZNETSOV, V. (2001). Influence of high power densities on the composition of pulsed magnetron plasmas. Vacuum, 65 (2), 147-154.