Electrical and structural characteristics of yttrium oxide films deposited by rf-magnetron sputtering on n-Si

EVANGELOU, E. K., WIEMER, C., FANCIULLI, M., SETHU, M. and CRANTON, Wayne (2003). Electrical and structural characteristics of yttrium oxide films deposited by rf-magnetron sputtering on n-Si. Journal of Applied Physics, 94 (1), 318-325.

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Official URL: http://scitation.aip.org/content/aip/journal/jap/9...
Link to published version:: https://doi.org/10.1063/1.1580644
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    Item Type: Article
    Additional Information: Cited By (since 1996):42 ID=184
    Research Institute, Centre or Group - Does NOT include content added after October 2018: Materials and Engineering Research Institute > Engineering Research
    Materials and Engineering Research Institute > Thin Films Research Centre > Electronic Materials and Sensors Research Group
    Identification Number: https://doi.org/10.1063/1.1580644
    Page Range: 318-325
    Depositing User: Wayne Cranton
    Date Deposited: 01 Jun 2016 12:43
    Last Modified: 18 Mar 2021 19:15
    URI: http://shura.shu.ac.uk/id/eprint/8013

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