Electrical and structural characteristics of yttrium oxide films deposited by rf-magnetron sputtering on n-Si

EVANGELOU, E. K., WIEMER, C., FANCIULLI, M., SETHU, M. and CRANTON, Wayne (2003). Electrical and structural characteristics of yttrium oxide films deposited by rf-magnetron sputtering on n-Si. Journal of Applied Physics, 94 (1), 318-325.

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Official URL: http://scitation.aip.org/content/aip/journal/jap/9...
Link to published version:: 10.1063/1.1580644
Item Type: Article
Additional Information: Cited By (since 1996):42 ID=184
Research Institute, Centre or Group: Materials and Engineering Research Institute > Engineering Research
Materials and Engineering Research Institute > Thin Films Research Centre > Electronic Materials and Sensors Research Group
Identification Number: 10.1063/1.1580644
Depositing User: Wayne Cranton
Date Deposited: 01 Jun 2016 12:43
Last Modified: 01 Jun 2016 12:48
URI: http://shura.shu.ac.uk/id/eprint/8013

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