Ion milling properties of laterally emitting thin-film electroluminescent materials

BARROS, S. O., STEVENS, R., THOMAS, C. B., CRANTON, Wayne and CRAVEN, M. (2001). Ion milling properties of laterally emitting thin-film electroluminescent materials. IEEE Transactions on Semiconductor Manufacturing, 14 (2), 173-176.

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Official URL: http://ieeexplore.ieee.org/xpl/articleDetails.jsp?...
Link to published version:: https://doi.org/10.1109/66.920730

Abstract

A study has been undertaken of the ion milling properties of ZnS:Mn, Y2O3, Si3N4, SiO2, SiOxNy, and Al versus the etching time, the acceleration voltage, and the angle of incidence of the ion beam. Different ZnS:Mn etched profiles have been fabricated by modifying the angle of incidence; these are in agreement with the reported simulations

Item Type: Article
Research Institute, Centre or Group - Does NOT include content added after October 2018: Materials and Engineering Research Institute > Advanced Coatings and Composites Research Centre > Electronic Materials and Sensors Research Group
Identification Number: https://doi.org/10.1109/66.920730
Page Range: 173-176
Depositing User: Wayne Cranton
Date Deposited: 04 Feb 2016 11:49
Last Modified: 18 Mar 2021 23:00
URI: https://shura.shu.ac.uk/id/eprint/7996

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