EHIASARIAN, Arutiun, ANDERSSON, Joakim and ANDERS, André (2010). Distance-dependent plasma composition and ion energy in high power impulse magnetron sputtering. Journal of Physics D: Applied Physics, 43 (27), p. 275204.
Full text not available from this repository.Link to published version:: 10.1088/0022-3727/43/27/275204
| Item Type: | Article |
|---|---|
| Research Institute, Centre or Group: | Materials and Engineering Research Institute > Thin Films Research Centre > Nanotechnology Centre for PVD Research |
| Identification Number: | 10.1088/0022-3727/43/27/275204 |
| Depositing User: | Ann Betterton |
| Date Deposited: | 12 Jul 2010 15:25 |
| Last Modified: | 12 Jul 2010 15:25 |
| URI: | http://shura.shu.ac.uk/id/eprint/2329 |
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