Distance-dependent plasma composition and ion energy in high power impulse magnetron sputtering

EHIASARIAN, Arutiun, ANDERSSON, Joakim and ANDERS, André (2010). Distance-dependent plasma composition and ion energy in high power impulse magnetron sputtering. Journal of Physics D: Applied Physics, 43 (27), p. 275204.

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Link to published version:: https://doi.org/10.1088/0022-3727/43/27/275204
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    Item Type: Article
    Research Institute, Centre or Group - Does NOT include content added after October 2018: Materials and Engineering Research Institute > Thin Films Research Centre > Nanotechnology Centre for PVD Research
    Identification Number: https://doi.org/10.1088/0022-3727/43/27/275204
    Page Range: p. 275204
    Depositing User: Ann Betterton
    Date Deposited: 12 Jul 2010 14:25
    Last Modified: 13 Jun 2017 12:47
    URI: http://shura.shu.ac.uk/id/eprint/2329

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