Items where SHU Author is "Anders, A."

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ANDERSSON, J., EHIASARIAN, A. P. and ANDERS, A. (2008). Observation of Ti4+ ions in a high power impulse magnetron sputtering plasma. Applied Physics Letters, 93 (7).

EHIASARIAN, A. P., ANDERS, A. and PETROV, I. (2007). Combined filtered cathodic arc etching pretreatment-magnetron sputter deposition of highly adherent CrN films. Journal of Vacuum Science & Technology A, 25 (3), 543-550.

ANDERS, A., ANDERSSON, J. and EHIASARIAN, A. P. (2007). High power impulse magnetron sputtering: Current-voltage-time characteristics indicate the onset of sustained self-sputtering. Journal of Applied Physics, 102 (11).

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