Interface recombination in GaAs-GaAlAs quantum

Non radiative carriers lifetime has been studied in MBE and MOCVD grown GaAs-GaAlAs undoped double heterostructures by luminescence decay technique. Interface recombination velocity is obtained by studying series of samples with different GaAs layer thicknesses d (between 1 µm and 20 Å). For each series S is constant when d is larger than 200 Å. When d is smaller than 200 Å, S increases due to the increase of the leaking of the carriers wave functions in the barrier when the well thickness decreases.