Growth and dielectric characterization of yttrium oxide thin films deposited on Si by r.f.-magnetron sputtering

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CRANTON, W. M., SPINK, D. M., STEVENS, R. and THOMAS, C. B. (1993). Growth and dielectric characterization of yttrium oxide thin films deposited on Si by r.f.-magnetron sputtering. Thin Solid Films, 226 (1), 156-160.

Full text not available from this repository.
Official URL: http://www.sciencedirect.com/science/article/pii/0...
Link to published version:: https://doi.org/10.1016/0040-6090(93)90222-B
Item Type: Article
Additional Information: Cited By (since 1996):47 ID=209
Research Institute, Centre or Group - Does NOT include content added after October 2018: Materials and Engineering Research Institute > Advanced Coatings and Composites Research Centre > Electronic Materials and Sensors Research Group
Identification Number: https://doi.org/10.1016/0040-6090(93)90222-B
Page Range: 156-160
Depositing User: Wayne Cranton
Date Deposited: 15 Feb 2016 15:45
Last Modified: 18 Mar 2021 23:00
URI: https://shura.shu.ac.uk/id/eprint/8004

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