Growth and dielectric characterization of yttrium oxide thin films deposited on Si by r.f.-magnetron sputtering

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CRANTON, W. M., SPINK, D. M., STEVENS, R. and THOMAS, C. B. (1993). Growth and dielectric characterization of yttrium oxide thin films deposited on Si by r.f.-magnetron sputtering. Thin Solid Films, 226 (1), 156-160. [Article]

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Official URL:
http://www.sciencedirect.com/science/article/pii/0...
Additional Information:
Cited By (since 1996):47 ID=209
Research Institute, Centre or Group - Does NOT include content added after October 2018:
Materials and Engineering Research Institute > Advanced Coatings and Composites Research Centre > Electronic Materials and Sensors Research Group
Page Range:
156-160

Identifiers

Identification Number:
10.1016/0040-6090(93)90222-B
ORCID for W. M. Cranton: ORCID iD orcid.org/0000-0002-0142-7810

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Item Type:
Article
Depositing User:
Wayne Cranton
Date Deposited:
15 Feb 2016 15:45
Last Modified:
18 Mar 2021 23:00
URI:
https://shura.shu.ac.uk/id/eprint/8004
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