Chemical vapour deposition of Ir-based coatings : chemistry, processes and applications

VASILYEV, V. Yu., MOROZOVA, N. B., BASOVA, T. V., IGUMENOV, I. K. and HASSAN, Aseel (2015). Chemical vapour deposition of Ir-based coatings : chemistry, processes and applications. RSC Advances, 5 (41), 32034-32063.

Hassan Chemical vapour deposition of Ir-based coatings.pdf - Published Version
Creative Commons Attribution Non-commercial.

Download (2MB) | Preview
Official URL:
Link to published version::
Related URLs:


Chemical and materials science aspects of iridium-containing thin film formation by Chemical Vapor Deposition (CVD) methods for modern high-precision technology applications are considered. Chemical approaches to the synthesis of the main precursors used in CVD techniques, thin film growth processes and mechanisms as well as the main structure, composition and properties of iridium-containing thin films are analyzed, and modern thin film application examples are outlined. Numerical characterization of iridium-based thin film growth in 3D objects is presented.

Item Type: Article
Additional Information: ** From Crossref via Jisc Publications Router.
Uncontrolled Keywords: General Chemistry, General Chemical Engineering
Research Institute, Centre or Group - Does NOT include content added after October 2018: Materials and Engineering Research Institute > Advanced Coatings and Composites Research Centre > Electronic Materials and Sensors Research Group
Identification Number:
Page Range: 32034-32063
SWORD Depositor: Hilary Ridgway
Depositing User: Hilary Ridgway
Date Deposited: 29 Nov 2017 12:55
Last Modified: 18 Mar 2021 16:20

Actions (login required)

View Item View Item


Downloads per month over past year

View more statistics