Chemical vapour deposition of Ir-based coatings : chemistry, processes and applications

Tools

VASILYEV, V. Yu., MOROZOVA, N. B., BASOVA, T. V., IGUMENOV, I. K. and HASSAN, Aseel (2015). Chemical vapour deposition of Ir-based coatings : chemistry, processes and applications. RSC Advances, 5 (41), 32034-32063. [Article]

[+][-]

Documents

17374:315686

[+][-]

17374:315686

[thumbnail of Hassan Chemical vapour deposition of Ir-based coatings.pdf]

Preview

PDF
Hassan Chemical vapour deposition of Ir-based coatings.pdf - Published Version
Available under License Creative Commons Attribution Non-commercial.

Download (2MB) | Preview

Abstract

Chemical and materials science aspects of iridium-containing thin film formation by Chemical Vapor Deposition (CVD) methods for modern high-precision technology applications are considered. Chemical approaches to the synthesis of the main precursors used in CVD techniques, thin film growth processes and mechanisms as well as the main structure, composition and properties of iridium-containing thin films are analyzed, and modern thin film application examples are outlined. Numerical characterization of iridium-based thin film growth in 3D objects is presented.

More Information

Official URL:

http://pubs.rsc.org/en/content/articlelanding/2015...

Additional Information:

** From Crossref via Jisc Publications Router.

Uncontrolled Keywords:

General Chemistry, General Chemical Engineering

Research Institute, Centre or Group - Does NOT include content added after October 2018:

Materials and Engineering Research Institute > Advanced Coatings and Composites Research Centre > Electronic Materials and Sensors Research Group

Page Range:

32034-32063

Related URLs: