High power impulse magnetron sputtering using a rotating cylindrical magnetron

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LEROY, W. P., MAHIEU, S., DEPLA, D. and EHIASARIAN, A. P. (2010). High power impulse magnetron sputtering using a rotating cylindrical magnetron. Journal of Vacuum Science and Technology A, 28 (1), 108-111. [Article]

Abstract
Both the industrially favorable deposition technique, high power impulse magnetron sputtering (HIPIMS), and the industrially popular rotating cylindrical magnetron have been successfully combined. A stable operation without arcing, leaks, or other complications for the rotatable magnetron was attained, with current densities around 11 A cm(-2). For Ti and Al, a much higher degree in ionization in the plasma region was observed for the HIPIMS mode compared to the direct current mode. (C) 2010 American Vacuum Society. [DOI: 10.1116/1.3271136]
More Information
Research Institute, Centre or Group - Does NOT include content added after October 2018:
Materials and Engineering Research Institute > Advanced Coatings and Composites Research Centre > Nanotechnology Centre for PVD Research
Page Range:
108-111

Identifiers

Identification Number:
10.1116/1.3271136
ORCID for A. P. Ehiasarian: ORCID iD orcid.org/0000-0001-6080-3946

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Item Type:
Article
Depositing User:
Ann Betterton
Date Deposited:
18 Feb 2010 16:26
Last Modified:
18 Mar 2021 10:15
URI:
https://shura.shu.ac.uk/id/eprint/1198
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