Items where Author is "Anders, A."
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ANDERSSON, J., EHIASARIAN, A. P. and ANDERS, A.
(2008).
Observation of Ti4+ ions in a high power impulse magnetron sputtering plasma.
Applied Physics Letters, 93 (7).
EHIASARIAN, A. P., ANDERS, A. and PETROV, I.
(2007).
Combined filtered cathodic arc etching pretreatment-magnetron sputter deposition of highly adherent CrN films.
Journal of Vacuum Science & Technology A, 25 (3), 543-550.
ANDERS, A., ANDERSSON, J. and EHIASARIAN, A. P.
(2007).
High power impulse magnetron sputtering: Current-voltage-time characteristics indicate the onset of sustained self-sputtering.
Journal of Applied Physics, 102 (11).