HOVSEPIAN, Papken, EHIASARIAN, Arutiun and PETROV, I. (2014). Structure evolution and properties of TiAlCN/VCN coatings deposited by reactive HIPIMS. Surface and coatings technology, 257, 38-47.Full text not available from this repository.
2.5. μm thick TiAlCN/VCN coatings were deposited by a reactive high power impulse magnetron sputtering (HIPIMS) process. Cross-sectional TEM showed gradual evolution of the structure of the coating with thickness. The initial structure is a nanoscale multilayer with sharp interlayer interfaces. This transforms to nanocomposite of TiAlCN and VCN nanocrystalline grains surrounded by a C-rich tissue phase and finally changes to an amorphous carbon rich Me-C phase. In contrast deposition in similar conditions using standard magnetron sputtering produces a well-defined nanoscale multilayer structure. Depth profiling by AES showed that the carbon content in the HIPIMS coating gradually increased from 25% at the coating substrate interface to 70% at the top thus supporting the TEM observations.Energy-resolved mass spectrometry revealed that HIPIMS plasma is a factor of 10 richer in C1+ ions, and therefore more reactive, as compared to the plasma generated by standard magnetron discharge at the same conditions. The peculiar structure evolution in HIPIMS is discussed in relation to target poisoning effect and carbon outward diffusion during coating growth.Highly abrasive AlSi9Cu1 alloy was dry machined using TiAlCN/VCN coated 25mm diameter end mills to investigate the coating-work piece material interaction. Green (532nm excitation) and ultraviolet (325nm excitation) Raman spectroscopy was employed to identify the phase composition of the built up material on the cutting edge and chip (swarf) surfaces produced during machining. These analyses revealed formation of lubricious Magnèli phases namely V2O5 and graphitic carbon as well as highly abrasive SiO2 and mixed (AlSi)O thus shedding light on the wear processes and coating tribological behavior during machining.
|Research Institute, Centre or Group:||Materials and Engineering Research Institute > Thin Films Research Centre > Nanotechnology Centre for PVD Research|
|Depositing User:||Hilary Ridgway|
|Date Deposited:||18 Nov 2014 12:47|
|Last Modified:||18 Nov 2014 12:47|
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