Growth and dielectric characterization of yttrium oxide thin films deposited on Si by r.f.-magnetron sputtering

CRANTON, W. M., SPINK, D. M., STEVENS, R. and THOMAS, C. B. (1993). Growth and dielectric characterization of yttrium oxide thin films deposited on Si by r.f.-magnetron sputtering. Thin Solid Films, 226 (1), 156-160.

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Official URL: http://www.sciencedirect.com/science/article/pii/0...
Link to published version:: https://doi.org/10.1016/0040-6090(93)90222-B
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    Item Type: Article
    Additional Information: Cited By (since 1996):47 ID=209
    Research Institute, Centre or Group - Does NOT include content added after October 2018: Materials and Engineering Research Institute > Thin Films Research Centre > Electronic Materials and Sensors Research Group
    Identification Number: https://doi.org/10.1016/0040-6090(93)90222-B
    Page Range: 156-160
    Depositing User: Wayne Cranton
    Date Deposited: 15 Feb 2016 15:45
    Last Modified: 18 Mar 2021 23:00
    URI: http://shura.shu.ac.uk/id/eprint/8004

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