Thin film characterization of novel phthalimide materials

CAPAN, S. Ren. R., OZEL, M.E., HASSAN, Aseel, TURHAN, O. and NAMLI, H. (2011). Thin film characterization of novel phthalimide materials. Optoelectronics and advanced materials - Rapid communications, 5 (11), 1243-1247.

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Abstract

Spin coating technique is employed to produce thin phthalimide films using novel p-phthalimidobenzoic acid (FIBA) and N-(phthalimido)-p-aminobenzoic acid (FIABA) materials. Several spin speeds and various solution concentrations are chosen to monitor the thin film deposition process of these new materials. The optical properties are studied using UV-visible spectroscopy and spectroscopic ellipsometry methods. The absorption of the FIBA and FIABA films against the spin speed showed an exponential behavior. π →π ∗ transition is occurred. The thicknesses of thin films at 2000 rpm are obtained 15.86 nm for FIBA and 12.99 nm for FIABA using spectroscopic ellipsometry results.

Item Type: Article
Research Institute, Centre or Group: Materials and Engineering Research Institute > Thin Films Research Centre > Electronic Materials and Sensors Research Group
Depositing User: Helen Garner
Date Deposited: 21 Sep 2012 15:37
Last Modified: 21 Sep 2012 15:37
URI: http://shura.shu.ac.uk/id/eprint/6178

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