TiAlCN/VCN nanolayer coatings suitable for machining of Al and Ti alloys deposited by combined high power impulse magnetron sputtering/unbalanced magnetron sputtering

HOVSEPIAN, Papken, EHIASARIAN, Arutiun and PETROV, I. (2010). TiAlCN/VCN nanolayer coatings suitable for machining of Al and Ti alloys deposited by combined high power impulse magnetron sputtering/unbalanced magnetron sputtering. Surface Engineering, 26 (8), p. 610.

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Link to published version:: 10.1179/026708408X336337

Abstract

Nanoscale multilayer TiAlCN/VCN coatings with bilayer thickness Δ=2·2 nm were deposited by the combined high power impulse magnetron sputtering (HIPIMS)/unbalanced magnetron sputtering technology. The V+ HIPIMS etching produced atomically clean interface and V implantation resulting in enhanced coating adhesion LC=58 N. High resolution transmission electron microscopy and electron energy loss spectroscopy revealed that in TiAlCN/VCN, carbon forms a lateral phase between the nanolayers, producing low shear strength interfaces. This results in a well defined nanometre scale layer by layer wear mechanism, which is the key for prevention of tribofilm and consequently thick built up layer formation. In dry milling of Al 7010-T 7651 alloy, TiAlCN/VCN outperformed state of the art diamond like carbon, Cr/WC/a-CH coated and uncoated end mills by factors of 4 and 8 respectively. In turning of Ti alloys (Ti0·90Al0·06V0·04) the TiAlCN/VCN coated cemented carbide inserts produced two to three times more components (orthopaedic implants), as compared to uncoated tools.

Item Type: Article
Research Institute, Centre or Group: Materials and Engineering Research Institute > Thin Films Research Centre > Nanotechnology Centre for PVD Research
Identification Number: 10.1179/026708408X336337
Depositing User: Ann Betterton
Date Deposited: 21 Dec 2010 16:45
Last Modified: 21 Dec 2010 16:45
URI: http://shura.shu.ac.uk/id/eprint/2882

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