Observation of Ti4+ ions in a high power impulse magnetron sputtering plasma

ANDERSSON, Joakim, EHIASARIAN, Arutiun and ANDERS, Andre (2008). Observation of Ti4+ ions in a high power impulse magnetron sputtering plasma. Applied Physics Letters, 93, 071504.

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Official URL: http://dx.doi.org/10.1063/1.2973179
Link to published version:: 10.1063/1.2973179

Abstract

Multiply charged titanium ions including Ti4+ were observed in high power impulse magnetron sputtering discharges. Mass/charge spectrometry was used to identify metal ion species. Quadruply charged titanium ions were identified by isotope-induced broadening at mass/charge 12. Due to their high potential energy, Ti4+ ions give a high yield of secondary electrons, which in turn are likely to be responsible for the generation of multiply charged states. 2008 American Institute of Physics.

Item Type: Article
Research Institute, Centre or Group: Materials and Engineering Research Institute > Thin Films Research Centre > Nanotechnology Centre for PVD Research
Identification Number: 10.1063/1.2973179
Depositing User: Arutiun Ehiasarian
Date Deposited: 24 Sep 2012 16:38
Last Modified: 24 Sep 2012 16:38
URI: http://shura.shu.ac.uk/id/eprint/2436

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