Observation of Ti4+ ions in a high power impulse magnetron sputtering plasma

ANDERSSON, Joakim, EHIASARIAN, Arutiun and ANDERS, Andre (2008). Observation of Ti4+ ions in a high power impulse magnetron sputtering plasma. Applied Physics Letters, 93, 071504.

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Official URL: http://dx.doi.org/10.1063/1.2973179
Link to published version:: https://doi.org/10.1063/1.2973179
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    Abstract

    Multiply charged titanium ions including Ti4+ were observed in high power impulse magnetron sputtering discharges. Mass/charge spectrometry was used to identify metal ion species. Quadruply charged titanium ions were identified by isotope-induced broadening at mass/charge 12. Due to their high potential energy, Ti4+ ions give a high yield of secondary electrons, which in turn are likely to be responsible for the generation of multiply charged states. 2008 American Institute of Physics.

    Item Type: Article
    Research Institute, Centre or Group - Does NOT include content added after October 2018: Materials and Engineering Research Institute > Thin Films Research Centre > Nanotechnology Centre for PVD Research
    Identification Number: https://doi.org/10.1063/1.2973179
    Page Range: 071504
    Depositing User: Arutiun Ehiasarian
    Date Deposited: 24 Sep 2012 15:38
    Last Modified: 18 Mar 2021 21:15
    URI: http://shura.shu.ac.uk/id/eprint/2436

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