Chemical vapour deposition of Ir-based coatings : chemistry, processes and applications

VASILYEV, V. Yu., MOROZOVA, N. B., BASOVA, T. V., IGUMENOV, I. K. and HASSAN, Aseel (2015). Chemical vapour deposition of Ir-based coatings : chemistry, processes and applications. RSC Advances, 5 (41), 32034-32063.

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Official URL: http://pubs.rsc.org/en/content/articlelanding/2015...
Link to published version:: 10.1039/c5ra03566j

Abstract

Chemical and materials science aspects of iridium-containing thin film formation by Chemical Vapor Deposition (CVD) methods for modern high-precision technology applications are considered. Chemical approaches to the synthesis of the main precursors used in CVD techniques, thin film growth processes and mechanisms as well as the main structure, composition and properties of iridium-containing thin films are analyzed, and modern thin film application examples are outlined. Numerical characterization of iridium-based thin film growth in 3D objects is presented.

Item Type: Article
Additional Information: ** From Crossref via Jisc Publications Router.
Uncontrolled Keywords: General Chemistry, General Chemical Engineering
Research Institute, Centre or Group: Materials and Engineering Research Institute > Thin Films Research Centre > Electronic Materials and Sensors Research Group
Identification Number: 10.1039/c5ra03566j
Related URLs:
SWORD Depositor: Hilary Ridgway
Depositing User: Hilary Ridgway
Date Deposited: 29 Nov 2017 12:55
Last Modified: 30 Nov 2017 07:32
URI: http://shura.shu.ac.uk/id/eprint/17374

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