DHARMADASA, I. M., IVES, M., BROOKS, J. S., FRANCE, G. H. and BROWN, S. J. (1995). Application of glow discharge optical emission spectroscopy to study semiconductors and semiconductor devices. Semiconductor Science and Technology, 10 (3), 369-372.Full text not available from this repository.
This letter introduces glow discharge optical emission spectroscopy for the study of semiconductors and semiconductor devices. It has been demonstrated that, by analysing simple Si-based devices, this technique is suitable for detecting impurity trace elements down to parts per million levels. It has also been shown that this is a fast and economical technique for depth profiling of semiconductor materials and device structures. The major advantages of this method are the low cost, speed and simplicity of analysis.
|Research Institute, Centre or Group:||Materials and Engineering Research Institute > Thin Films Research Centre > Electronic Materials and Sensors Research Group|
|Depositing User:||Ann Betterton|
|Date Deposited:||08 Mar 2010 14:48|
|Last Modified:||29 Sep 2010 16:58|
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