High power impulse magnetron sputtering using a rotating cylindrical magnetron

LEROY, W. P., MAHIEU, S., DEPLA, D. and EHIASARIAN, A. P. (2010). High power impulse magnetron sputtering using a rotating cylindrical magnetron. Journal of Vacuum Science and Technology A, 28 (1), 108-111.

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Link to published version:: https://doi.org/10.1116/1.3271136
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    Abstract

    Both the industrially favorable deposition technique, high power impulse magnetron sputtering (HIPIMS), and the industrially popular rotating cylindrical magnetron have been successfully combined. A stable operation without arcing, leaks, or other complications for the rotatable magnetron was attained, with current densities around 11 A cm(-2). For Ti and Al, a much higher degree in ionization in the plasma region was observed for the HIPIMS mode compared to the direct current mode. (C) 2010 American Vacuum Society. [DOI: 10.1116/1.3271136]

    Item Type: Article
    Research Institute, Centre or Group - Does NOT include content added after October 2018: Materials and Engineering Research Institute > Thin Films Research Centre > Nanotechnology Centre for PVD Research
    Identification Number: https://doi.org/10.1116/1.3271136
    Page Range: 108-111
    Depositing User: Ann Betterton
    Date Deposited: 18 Feb 2010 16:26
    Last Modified: 18 Mar 2021 10:15
    URI: http://shura.shu.ac.uk/id/eprint/1198

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