LEROY, W. P., MAHIEU, S., DEPLA, D. and EHIASARIAN, A. P. (2010). High power impulse magnetron sputtering using a rotating cylindrical magnetron. Journal of Vacuum Science and Technology A, 28 (1), 108-111.Full text not available from this repository.
Both the industrially favorable deposition technique, high power impulse magnetron sputtering (HIPIMS), and the industrially popular rotating cylindrical magnetron have been successfully combined. A stable operation without arcing, leaks, or other complications for the rotatable magnetron was attained, with current densities around 11 A cm(-2). For Ti and Al, a much higher degree in ionization in the plasma region was observed for the HIPIMS mode compared to the direct current mode. (C) 2010 American Vacuum Society. [DOI: 10.1116/1.3271136]
|Research Institute, Centre or Group:||Materials and Engineering Research Institute > Thin Films Research Centre > Nanotechnology Centre for PVD Research|
|Depositing User:||Ann Betterton|
|Date Deposited:||18 Feb 2010 16:26|
|Last Modified:||18 Feb 2010 16:26|
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