Ion composition produced by high power impulse magnetron sputtering discharges near the substrate

EHIASARIAN, A. P., VETUSHKA, A., HECIMOVIC, A. and KONSTANTINIDIS, S. (2008). Ion composition produced by high power impulse magnetron sputtering discharges near the substrate. Journal of Applied Physics, 104 (8).

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Link to published version:: 10.1063/1.3000446

Abstract

Plasma composition near the substrate was investigated in a high power impulse magnetron sputtering (HIPIMS) discharge using Langmuir probe analysis, mass spectroscopy, and atomic absorption spectroscopy. The HIPIMS discharge was operated in nonreactive Ar atmosphere at a pressure of 2.66 Pa and the magnetron cathode was furnished with Ti target. Plasma density, metal ion-to-neutral ratio, and gas ion-to-metal ion ratio were studied as a function of discharge current. At peak discharge current densities of similar to 1 A cm(-2), the results show that a dense plasma (n(e) similar to 10(18) m(-3)) expanded from the target toward the substrate and lasted more than 330 mu s after the supplied power was turned off. The shape of the time-averaged ion energy distribution function of sputtered material exhibited a transition from Thompson to Maxwellian distribution, indicating efficient energy transfer in the discharge. The metal content in the plasma monotonically increased with discharge current and the metal ion-to-neutral ratio reached approximately 1: 1 in the postdischarge plasma at peak current density of 5 A cm(-2). (C) 2008 American Institute of Physics. [DOI: 10.1063/1.3000446]

Item Type: Article
Research Institute, Centre or Group: Materials and Engineering Research Institute > Thin Films Research Centre > Nanotechnology Centre for PVD Research
Identification Number: 10.1063/1.3000446
Depositing User: Ann Betterton
Date Deposited: 18 Feb 2010 16:50
Last Modified: 23 Sep 2010 12:55
URI: http://shura.shu.ac.uk/id/eprint/1193

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