The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge

BOHLMARK, J., LATTEMANN, M., GUDMUNDSSON, J. T., EHIASARIAN, A. P., GONZALVO, Y. A., BRENNING, N. and HELMERSSON, U. (2006). The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge. Thin Solid Films, 515 (4), 1522-1526.

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Link to published version:: https://doi.org/10.1016/j.tsf.2006.04.051
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    Abstract

    The energy distribution of sputtered and ionized metal atoms as well as ions from the sputtering gas is reported for a high power impulse magnetron sputtering (HIPIMS) discharge. High power pulses were applied to a conventional planar circular magnetron Ti target. The peak power on the target surface was 1-2 kW/cm(2) with a duty factor of about 0.5%. Time resolved, and time averaged ion energy distributions were recorded with an energy resolving quadrupole mass spectrometer. The ion energy distributions recorded for the HIPIMS discharge are broader with maximum detected energy of 100 eV and contain a larger fraction of highly energetic ions (about 50% with E-i > 20 eV) as compared to a conventional direct current magnetron sputtering discharge. The composition of the ion flux was also determined, and reveals a high metal fraction. During the most intense moment of the discharge, the ionic flux consisted of approximately 50% Ti1+, 24% Ti2+, 23% Ar1+, and 3% Ar2+ ions. (c) 2006 Elsevier B.V. All rights reserved.

    Item Type: Article
    Research Institute, Centre or Group - Does NOT include content added after October 2018: Materials and Engineering Research Institute > Advanced Coatings and Composites Research Centre > Nanotechnology Centre for PVD Research
    Identification Number: https://doi.org/10.1016/j.tsf.2006.04.051
    Page Range: 1522-1526
    Depositing User: Ann Betterton
    Date Deposited: 18 Feb 2010 17:01
    Last Modified: 18 Mar 2021 09:45
    URI: https://shura.shu.ac.uk/id/eprint/1189

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