Observation of Ti4+ ions in a high power impulse magnetron sputtering plasma

ANDERSSON, J., EHIASARIAN, A. P. and ANDERS, A. (2008). Observation of Ti4+ ions in a high power impulse magnetron sputtering plasma. Applied Physics Letters, 93 (7).

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Link to published version:: 10.1063/1.2973179

Abstract

Multiply charged titanium ions including Ti4+ were observed in high power impulse magnetron sputtering discharges. Mass/charge spectrometry was used to identify metal ion species. Quadruply charged titanium ions were identified by isotope-induced broadening at mass/charge 12. Due to their high potential energy, Ti4+ ions give a high yield of secondary electrons, which in turn are likely to be responsible for the generation of multiply charged states. (c) 2008 American Institute of Physics.

Item Type: Article
Research Institute, Centre or Group: Materials and Engineering Research Institute > Thin Films Research Centre > Nanotechnology Centre for PVD Research
Identification Number: 10.1063/1.2973179
Depositing User: Ann Betterton
Date Deposited: 23 Feb 2010 17:03
Last Modified: 02 May 2013 16:30
URI: http://shura.shu.ac.uk/id/eprint/1187

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