Observation of Ti4+ ions in a high power impulse magnetron sputtering plasma

ANDERSSON, J., EHIASARIAN, A. P. and ANDERS, A. (2008). Observation of Ti4+ ions in a high power impulse magnetron sputtering plasma. Applied Physics Letters, 93 (7).

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Link to published version:: https://doi.org/10.1063/1.2973179
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    Abstract

    Multiply charged titanium ions including Ti4+ were observed in high power impulse magnetron sputtering discharges. Mass/charge spectrometry was used to identify metal ion species. Quadruply charged titanium ions were identified by isotope-induced broadening at mass/charge 12. Due to their high potential energy, Ti4+ ions give a high yield of secondary electrons, which in turn are likely to be responsible for the generation of multiply charged states. (c) 2008 American Institute of Physics.

    Item Type: Article
    Research Institute, Centre or Group - Does NOT include content added after October 2018: Materials and Engineering Research Institute > Thin Films Research Centre > Nanotechnology Centre for PVD Research
    Identification Number: https://doi.org/10.1063/1.2973179
    Depositing User: Ann Betterton
    Date Deposited: 23 Feb 2010 17:03
    Last Modified: 13 Jun 2017 12:45
    URI: http://shura.shu.ac.uk/id/eprint/1187

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