Elemental distributions and substrate rotation in industrial TiAlN/VN superlattice hard PVD coatings

ZHOU, Z. X., RAINFORTH, W. M., ROTHER, B., EHIASARIAN, A. P., HOVSEPIAN, P. E. and MUNZ, W. D. (2004). Elemental distributions and substrate rotation in industrial TiAlN/VN superlattice hard PVD coatings. Surface and Coatings Technology, 183 (2-3), 275-282.

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Link to published version:: 10.1016/j.surfcoat.2003.09.060

Abstract

Chemical distribution of individual layers within a TiAlN/VN multilayer structure was characterised using a field emission gun transmission electron microscope, coupled with energy-filtered elemental mapping and high-angle annular dark field imaging. Bright field TEM micrographs using zero-loss electrons indicated the presence of alternating TiAlN and VN layers with a periodicity of similar to 3 nm. Electron spectroscopic images (ESI) using the Ti-L-2.3 and V-L-2.3 edges were used to determine the Ti and V composition profiles of layers and confirmed the complementary distribution of Ti and V. ESI demonstrated an additional modulation super-imposed on the basic period of the coatings, which was confirmed by Z-contrast imaging using scanning transmission electron microscopy. The additional modulation was related to the threefold rotational geometry used in the deposition process. Film growth and elemental distributions were therefore theoretically predicted in association with substrate rotation. The experimental compositional profiles and the prediction showed good agreement. The implications of the compositional modulation on key process parameters are discussed. (C) 2003 Elsevier B.V. All rights reserved.

Item Type: Article
Research Institute, Centre or Group: Materials and Engineering Research Institute > Thin Films Research Centre > Nanotechnology Centre for PVD Research
Identification Number: 10.1016/j.surfcoat.2003.09.060
Depositing User: Ann Betterton
Date Deposited: 16 Feb 2010 14:27
Last Modified: 16 Feb 2010 14:27
URI: http://shura.shu.ac.uk/id/eprint/1161

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