On the structure and composition of nanoscale TiAIN/VN multilayers

ZHOU, Z., RAINFORTH, W. M., FALKE, U., FALKE, M., BLELOCH, A. and HOVSEPIAN, P. E. (2007). On the structure and composition of nanoscale TiAIN/VN multilayers. Philosophical Magazine, 87 (6), 967-978.

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Link to published version:: https://doi.org/10.1080/14786430601019433
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    The chemical and physical structure of a TiAlN/VN multilayer, of average layer thickness 3.4 +/- 0.4nm, was characterized using a spherical aberration-corrected STEM, utilizing a nominal 0.1-nm beam, by HAADF and EELS. The interface between layers was shown to be rough, with local thickness variations evident in layer thickness. Chemical mixing between layers was identified, consistent with numerical modelling of the deposition flux and layer growth. The implications of the compositional modulation are discussed.

    Item Type: Article
    Research Institute, Centre or Group - Does NOT include content added after October 2018: Materials and Engineering Research Institute > Thin Films Research Centre > Nanotechnology Centre for PVD Research
    Identification Number: https://doi.org/10.1080/14786430601019433
    Page Range: 967-978
    Depositing User: Ann Betterton
    Date Deposited: 16 Feb 2010 15:18
    Last Modified: 11 Oct 2018 13:47
    URI: http://shura.shu.ac.uk/id/eprint/1158

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