Influence of ion bombardment on the properties and microstructure of unbalanced magnetron deposited niobium coatings

SAVISALO, T., LEWIS, D. B., HOVSEPIAN, P. E. and MUNZ, W. D. (2004). Influence of ion bombardment on the properties and microstructure of unbalanced magnetron deposited niobium coatings. Thin Solid Films, 460 (1-2), 94-100.

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Link to published version:: 10.1016/j.tsf.2003.12.150

Abstract

The effect of the ion bombardment to unbalanced magnetron deposited, approximately 1.5 and 4.5 mum thick, Nb coatings have been investigated as the bias voltage was varied from U-B = -75 to -150 V. Increasing bias voltage increased the hardness of the coating from 4.5 to 8.0 GPa. This was associated with residual stress and Ar incorporation into the Nb lattice. Strong {110} texture developed in the samples deposited at low bias voltages, while beyond U-B = -100 V a {111} texture became dominant. However, strong {111} texture was observed only with the thicker 3Nb coatings. Secondary electron microscopy investigation of the coating topography showed fewer defects in the thicker coatings. All coatings exhibited good corrosion resistance, with the thicker coatings clearly outperforming the thinner ones. Excessive bias voltages (U-B = -150 V) was found to lead to poor adhesion and loss of corrosion resistance. (C) 2004 Elsevier B.V. All rights reserved.

Item Type: Article
Research Institute, Centre or Group: Materials and Engineering Research Institute > Thin Films Research Centre > Nanotechnology Centre for PVD Research
Identification Number: 10.1016/j.tsf.2003.12.150
Depositing User: Ann Betterton
Date Deposited: 16 Feb 2010 14:43
Last Modified: 16 Feb 2010 14:43
URI: http://shura.shu.ac.uk/id/eprint/1147

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