KOK, Y. N., HOVSEPIAN, P. E., LUO, Q., LEWIS, D. B., WEN, J. G. and PETROV, I. (2005). Influence of the bias voltage on the structure and the tribological performance of nanoscale multilayer C/Cr PVD coatings. Thin Solid Films, 475 (1-2), 219-226.Full text not available from this repository.
Nanoscale multilayer C/Cr coatings have been deposited by utilising the combined steered cathodic arc/unbalanced magnetron sputtering technique. The coating microstructure and tribological performance have been investigated as a function of the bias voltage, ranging from U-b=-65 to -350 V. The XRD results revealed that C/Cr coatings are amorphous at low U-b, but became more crystalline when the Ub increased to -350 V. High-resolution XTEM analysis indicated coating densification and smoothening as well as formation of novel amorphous nanostructure, in which carbon-rich clusters are surrounded by a Cr-rich matrix, leading to the formation of self-organised multilayer structure as the bias voltage was increased from -65 to -350 V. An increase of the bias voltage from -65 to -350 V resulted in an increase in the hardness from 8 to 25 CiPa and Young's modulus, E from 186 to 319 GPa. A pin-on-disc test showed that the friction coefficient was reduced from 0.22 to 0.16 when the bias voltage was increased from -65 to -95 V However, a further increase in the bias voltage to -350 V led to an increase in the friction coefficient to 0.31. The lowest wear coefficient K(c)similar to6.25 x 10(-17) m(3) N-1 m(-1) was achieved at U-b = - 120 V. Standard HSS drills, 8 mm in diameter, coated with C/Cr have been tested using solution annealed AISI 304 stainless steel as the work piece material. An improvement of the lifetime by a factor of similar to9 has been achieved as compared to the uncoated tools. In this test, the C/Cr coating outperformed a number of commercially available PVD coatings, such as TiCN, TiAlCrN and showed similar performance to TiAlCrYN. (C) 2004 Elsevier B.V. All rights reserved.
|Additional Information:||4th Asian-European International Conference on Plasma Surface Engineering SEP 28-OCT 03, 2003, Jeju City, SOUTH KOREA|
|Research Institute, Centre or Group:||Materials and Engineering Research Institute > Thin Films Research Centre > Nanotechnology Centre for PVD Research|
Materials and Engineering Research Institute > Materials Analysis and Research Services
|Depositing User:||Ann Betterton|
|Date Deposited:||16 Feb 2010 14:55|
|Last Modified:||10 Sep 2010 16:09|
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