The significance of carbon on the microstructure of TiAlN-C coatings deposited by reactive magnetron sputtering

HUANG, Y. Z., STUEBER, M. and HOVSEPIAN, P. E. (2006). The significance of carbon on the microstructure of TiAlN-C coatings deposited by reactive magnetron sputtering. Applied Surface Science, 253 (5), 2470-2473.

Full text not available from this repository.
Link to published version:: 10.1016/j.apsusc.2006.05.003

Abstract

A series of TiAICN coatings with different carbon contents have been deposited by a reactive sputtering of TiAl target under an environment with a mixture of Ar, N-2 and CH4 gases. Microstructural changes, starting from pure TiAlN and then into TiAICN with the increase of the carbon content, have been clearly demonstrated. This occurrence is due to the carbon atom substitution that results in a small alternation of the interplannar lattice parameter. The coating initially shows a strong preferred (1 1 1) texture in the pure TiAIN but becomes more randomly oriented at the higher carbon contents. Evidence was found for the presence of a free carbon phase, which provides the possibility to accomplish the self-lubricant coating. (c) 2006 Elsevier B.V. All rights reserved.

Item Type: Article
Research Institute, Centre or Group: Materials and Engineering Research Institute > Thin Films Research Centre > Nanotechnology Centre for PVD Research
Identification Number: 10.1016/j.apsusc.2006.05.003
Depositing User: Ann Betterton
Date Deposited: 17 Feb 2010 15:43
Last Modified: 17 Feb 2010 15:43
URI: http://shura.shu.ac.uk/id/eprint/1123

Actions (login required)

View Item

Downloads

Downloads per month over past year

View more statistics