HOVSEPIAN, P. E., EHIASARIAN, A. P. and RATAYSKI, U. (2009). CrAlYCN/CrCN nanoscale multilayer PVD coatings deposited by the combined High Power Impulse Magnetron Sputtering/Unbalanced Magnetron Sputtering (HIPIMS/UBM) technology. Surface and Coatings Technology, 203 (9), 1237-1243.Full text not available from this repository.
CrAlYCN/CrCN coating combining high hardness (H-p=36 GPa) and low friction coefficient (mu=0.42 against Al2O3) has been developed for machining of Si containing Al-alloys. The coating was deposited by the combined High Power Impulse Magnetron Sputtering/Unbalanced Magnetron sputtering, (HIPIMS/UBM) technology. Macroparticle free Cr+ ion flux was generated by HIPIMS discharge to sputter clean the substrates prior to the coating deposition. The use of HIPIMS for surface pre treatment resulted in excellent adhesion, scratch test adhesion critical load value of Lc=55 N on HSS and Lc=68 N due to the local epitaxial growth and extremely smooth coating surface, Ra=0.012 pm due to the elimination of growth defects. The coating crystallised in fcc structure with a preferred (220) orientation. XTEM analysis revealed a nanoscale multilayer structure of the coating with carbon segregated at the column boundaries but also vertically to form a lateral phase at the interfaces between the individual nanolayers. Addition of C to CrAlYN/CrN increased the chemical inertness between cutting tool and workpiece material without deteriorating the oxidation resistance of the coating. Thermo gravimetric analysis showed that the temperature for the onset of rapid oxidation was as high as 940 degrees C. In dry milling of AlSi9Cu1 alloy, CrAlYCN/CrCN coated 8 mm diameter cemented carbide end mills outperformed non coated end mills by factor of 2.5 with effective hindered built up edge formation mechanism.
|Research Institute, Centre or Group:||Materials and Engineering Research Institute > Thin Films Research Centre > Nanotechnology Centre for PVD Research|
|Depositing User:||Ann Betterton|
|Date Deposited:||16 Feb 2010 13:54|
|Last Modified:||16 Feb 2010 13:54|
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