Novel TiAlCN/VCN nanoscale multilayer PVD coatings deposited by the combined high-power impulse magnetron sputtering/unbalanced magnetron sputtering (HIPIMS/UBM) technology

HOVSEPIAN, P. E., EHIASARIAN, A. P., DEEMING, A. and SCHIMPF, C. (2008). Novel TiAlCN/VCN nanoscale multilayer PVD coatings deposited by the combined high-power impulse magnetron sputtering/unbalanced magnetron sputtering (HIPIMS/UBM) technology. Vacuum, 82 (11), 1312-1317.

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Link to published version:: 10.1016/j.vacuum.2008.03.064

Abstract

A new TiAlCN/VCN coating combining high hardness, low friction coefficient and chemical inertness has been developed for dry machining of "Sticky" (Al-, Ti- and Ni-based) alloys as well as advanced Metal-Matrix-Composite (MMC) materials used in aerospace and automotive industries. Excellent performance was achieved due to the synergy between V and C as main coating elements and the nanoscale multilayer structure of the coating. TiAlCN/VCN was deposited by the combined High-Power Impulse Magnetron Sputtering/Unbalanced Magnetron sputtering (HIPIMS/UBM) technology. Macroparticle free V+ ion flux generated by HIPIMS discharge was used to sputter clean the substrates prior to the coating deposition. A 0.4 mu m thick TiAlN base layer followed by 3 mu m thick TiAlCN/VCN nanoscale multilayer coating was deposited by unbalanced magnetron sputtering. The sputtering was carried out in a mixed CH4, N-2 and At atmosphere. In dry milling of Al7010-T7651 alloy, TiAlCN/VCN nanoscale multilayer PVD coating outperformed state of the art Diamond Like Carbon (DLC, Cr/WC/a-CH) coating by factor of 4. In drilling Al-alloy enforced MMC materials, cemented carbide drills coated with TiAlCN/VCN produced 130 holes compared to 1-2 holes with uncoated drills. (c) 2008 Elsevier Ltd. All rights reserved.

Item Type: Article
Research Institute, Centre or Group: Materials and Engineering Research Institute > Thin Films Research Centre > Nanotechnology Centre for PVD Research
Identification Number: 10.1016/j.vacuum.2008.03.064
Depositing User: Ann Betterton
Date Deposited: 16 Feb 2010 15:13
Last Modified: 16 Feb 2010 15:13
URI: http://shura.shu.ac.uk/id/eprint/1110

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