Items where SHU Author is "Loch, Daniel"

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BISWAS, Barnali, PURANDARE, Yashodhan, ARUNACHALAMSUGUMARAN, Arunprabhu, LOCH, Daniel, CREASY, Stuart, KHAN, Imran, EHIASARIAN, Arutiun and HOVSEPIAN, Papken (2017). Defect growth in multilayer chromium nitride/niobium nitride coatings produced by combined high power impulse magnetron sputtering and unbalance magnetron sputtering technique. Thin Solid Films, 636, 558-566.

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LOCH, Daniel, ARANDA GONZALVO, Yolanda and EHIASARIAN, Arutiun (2017). Plasma analysis of Inductively Coupled Impulse Sputtering of Cu, Ti and Ni. Plasma Sources Science and Technology, 26 (6).

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LOCH, Daniel and EHIASARIAN, Arutiun (2017). Study of the Effect of RF-power and process pressure on the morphology of copper and titanium sputtered by ICIS. Surface and coatings technology, 327, 200-206.

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LOCH, Daniel A.L., GONZALVO, Yolanda A. and EHIASARIAN, Arutiun P. (2015). Nickel coatings by Inductively Coupled Impulse Sputtering (ICIS). Surface and coatings technology, 267, 98-104.

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HOVSEPIAN, Papken, ARUNACHALAMSUGUMARAN, Arunprabhu, PURANDARE, Yashodhan, LOCH, Daniel and EHIASARIAN, Arutiun (2014). Effect of the degree of high power impulse magnetron sputtering utilisation on the structure and properties of TiN films. Thin Solid Films, 562, 132-139.

LEWIN, Erik, LOCH, Daniel, MONTAGNE, Alex, EHIASARIAN, Arutiun P. and PATSCHEIDER, Jörg (2013). Comparison of Al–Si–N nanocomposite coatings deposited by HIPIMS and DC magnetron sputtering. Surface and coatings technology, 232, 680-689.

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LOCH, Daniel and EHIASARIAN, Arutiun (2012). A novel sputtering technique: Inductively Coupled Impulse Sputtering (ICIS). IOP Conference Series: Materials Science and Engineering, 39 (012006).

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