Items where SHU Author is "Ehiasarian, Arutiun"

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HOVSEPIAN, Papken, ARUNACHALAMSUGUMARAN, Arunprabhu, PURANDARE, Yashodhan, LOCH, Daniel and EHIASARIAN, Arutiun (2014). Effect of the degree of high power impulse magnetron sputtering utilisation on the structure and properties of TiN films. Thin Solid Films, 562, 132-139.

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PURANDARE, Yashodhan, EHIASARIAN, Arutiun, SANTANA, Antonio and HOVSEPIAN, Papken (2014). ZrN coatings deposited by high power impulse magnetron sputtering and cathodic arc techniques. Journal of Vacuum Science & Technology A, 32 (3).

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EHIASARIAN, Arutiun, HECIMOVIC, A., DE LOS ARCOS, T., NEW, Roger, DER GATHEN, V. Schulz-von, BOKE, M. and WINTER, J. (2012). High power impulse magnetron sputtering discharges: Instabilities and plasma self-organization. Applied Physics Letters, 100 (11), p. 114101.

KUSIAK-NEJMAN, E., MORAWSKI, A.W., EHIASARIAN, A P., PULGARIN, C., BAGHRICHE, O., MIELCZARSKI, E., MIELCZARSKI, J., KULIK, A. and KIWI, J. (2011). E. coli Inactivation by High-Power Impulse Magnetron Sputtered (HIPIMS) Cu Surfaces. The Journal of Physical Chemistry C, 115 (43), 21113-21119.

EHIASARIAN, Arutiun, VETUSHKA, A., GONZALVO, Y. Aranda, SÁFRÁN, G., SZÉKELY, L. and BARNA, P. B. (2011). Influence of high power impulse magnetron sputtering plasma ionization on the microstructure of TiN thin films. Journal of Applied Physics, 109 (10), p. 104314.

PURANDARE, Yashodhan, EHIASARIAN, Arutiun and HOVSEPIAN, Papken (2011). Structure and properties of ZrN coatings deposited by high power impulse magnetron sputtering technology. Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films, 29 (1), 011004.

KAMATH, G., EHIASARIAN, A. P., PURANDARE, Y. and HOVSEPIAN, P. (2011). Tribological and oxidation behaviour of TiAlCN/VCN nanoscale multilayer coating deposited by the combined HIPIMS/(HIPIMS-UBM) technique. Surface and Coatings Technology, 205 (8-9), p. 2823.

ZHOU, Z., ROSS, I.M., MA, L., RAINFORTH, W.M., EHIASARIAN, Arutiun and HOVSEPIAN, Papken (2011). Wear of hydrogen free C/Cr PVD coating against Al2O3 at room temperature. Wear, 271 (9-10), 2150-2156.

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PURANDARE, Y. P., EHIASARIAN, A. P., STACK, M. M. and HOVSEPIAN, P. E. (2010). CrN/NbN coatings deposited by HIPIMS: A preliminary study of erosion-corrosion performance. Surface and coatings technology, 204 (8), 1158-1162.

PURANDARE, Y.P., EHIASARIAN, Arutiun, STACK, M.M. and HOVSEPIAN, Papken (2010). CrN/NbN coatings deposited by HIPIMS: A preliminary study of erosion–corrosion performance. Surface and Coatings Technology, 204 (8), 1158-1162.

EHIASARIAN, Arutiun, ANDERSSON, Joakim and ANDERS, André (2010). Distance-dependent plasma composition and ion energy in high power impulse magnetron sputtering. Journal of Physics D: Applied Physics, 43 (27), p. 275204.

ROSS, I M, ZHOU, Z, RAINFORTH, W M, BLELOCH, A, EHIASARIAN, Arutiun and HOVSEPIAN, Papken (2010). EELS and STEM analysis of metal nitride/substrate interfaces. Journal of Physics: Conference Series, 241, 012102.

HALBE, A., JOHNSON, P., JACKSON, S., WEISS, R., AVACHAT, U., WELSH, A. and EHIASARIAN, A. (2010). High efficiency Copper Indium Gallium Diselenide (CIGS) by high Power Impulse Magnetron Sputtering (HIPIMS): a promising and scalable application in thin-film photovoltaics. In: Materials Research Society Symposium Proceedings. Materials Research Society, 179-184.

LEROY, W. P., MAHIEU, S., DEPLA, D. and EHIASARIAN, A. P. (2010). High power impulse magnetron sputtering using a rotating cylindrical magnetron. Journal of Vacuum Science and Technology A, 28 (1), 108-111.

HOVSEPIAN, Papken and EHIASARIAN, Arutiun (2010). Novel CrAlYN/CrN nanoscale multilayer PVD coatings produced by the combined high power impulse magnetron sputtering/unbalanced magnetron sputtering technique for environmental protection of gamma TiAl alloys. Surface and Coatings Technology, 204 (16-17), 2702-2708.

BRAUN, Reinhold, SCHULZ, Uwe, LEYENS, Christoph, HOVSEPIAN, Papken and EHIASARIAN, Arutiun (2010). Oxidation and fatigue behaviour of γ-TiAl coated with HIPIMS CrAlYN/CrN nanoscale multilayer coatings and EB-PVD thermal barrier coatings. International Journal of Materials Research (formerly Zeitschrift fuer Metallkunde), 101 (5), 648-656.

YUKIMURA, Ken and EHIASARIAN, Arutiun (2010). Properties of TiAlCN/VCN Nanoscale Multilayer Coatings Deposited by Mixed High-Power Impulse Magnetron Sputtering (HiPIMS) and Unbalanced Magnetron Sputtering Processes—Impact of HiPIMS During Coating. IEEE Transactions on Plasma Science, 38 (11), 3005-3006.

KAMATH, G., EHIASARIAN, A. P. and HOVSEPIAN, P. (2010). Properties of TiAlCN/VCN nanoscale multilayer coatings deposited by mixed high-power impulse magnetron sputtering (HiPIMS) and unbalanced magnetron sputtering processes - impact of HiPIMS during coating. IEEE Transactions on Plasma Science, 38 (11), 3062-3070.

HECIMOVIC, A. and EHIASARIAN, A. P. (2010). Spatial and temporal evolution of ion energies in high power impulse magnetron sputtering plasma discharge. Journal of Applied Physics, 108 (6), 063301.

HOVSEPIAN, Papken, EHIASARIAN, Arutiun and PETROV, I. (2010). TiAlCN/VCN nanolayer coatings suitable for machining of Al and Ti alloys deposited by combined high power impulse magnetron sputtering/unbalanced magnetron sputtering. Surface Engineering, 26 (8), p. 610.

ZHOU, Z. X., ROSS, I. M., RAINFORTH, W. M., CAVALEIRO, A., EHIASARIAN, A. P. and HOVSEPIAN, P. E. (2009). Degradation of a C/CrC PVD coating after annealing in Ar + H-2 at 700 degrees C studied by Raman spectroscopy and transmission electron microscopy. Materials at high temperatures, 26 (2), 169-176.

HOVSEPIAN, P. E., EHIASARIAN, A. P., PURANDARE, Y. P., BRAUN, R. and ROSS, I. M. (2009). Effect of High Ion Irradiation on the Structure, Properties and High Temperature Tribology of Nanoscale CrAlYN/CrN Multilayer Coating Deposited by HIPIMS-HIPIMS Technique. Plasma Processes and Polymers, 6, S118-S123.

YUKIMURA, K. and EHIASARIAN, A. P. (2009). Generation of RF plasma assisted high power pulsed sputtering glow discharge without using a magnetic field. Nuclear Instruments and Methods in Physics Research. Section B-Beam Interactions with Materials and Atoms, 267 (8-9), 1701-1704.

SAFRAN, G., REINHARD, C., EHIASARIAN, A. P., BARNA, P. B., SZEKELY, L., GESZTI, O. and HOVSEPIAN, P. E. (2009). Influence of the bias voltage on the structure and mechanical performance of nanoscale multilayer CrAlYN/CrN physical vapor deposition coatings. Journal of Vacuum Science & Technology A, 27 (2), 174-182.

MACHUNZE, R., EHIASARIAN, A. P., TICHELAAR, F. D. and JANSSEN, G. (2009). Stress and texture in HIPIMS TiN thin films. Thin Solid Films, 518 (5), 1561-1565.

HECIMOVIC, , A. and EHIASARIAN, A. P. (2009). Time evolution of ion energies in HIPIMS of chromium plasma discharge. Journal of Physics D: Applied Physics, 42 (13).

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PURANDARE, Y. P., EHIASARIAN, A. P. and HOVSEPIAN, P. E. (2008). Deposition of nanoscale multilayer CrN/NbN physical vapor deposition coatings by high power impulse magnetron sputtering. Journal of Vacuum Science & Technology A, 26 (2), 288-296.

PURANDARE, Yashodhan, EHIASARIAN, Arutiun and HOVSEPIAN, Papken (2008). Deposition of nanoscale multilayer CrN/NbN physical vapor deposition coatings by high power impulse magnetron sputtering. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 26 (2), p. 288.

EHIASARIAN, A. P., VETUSHKA, A., HECIMOVIC, A. and KONSTANTINIDIS, S. (2008). Ion composition produced by high power impulse magnetron sputtering discharges near the substrate. Journal of Applied Physics, 104 (8).

BURCALOVA, K., HECIMOVIC, A. and EHIASARIAN, A. P. (2008). Ion energy distributions and efficiency of sputtering process in HIPIMS system. Journal of Physics D: Applied Physics, 41 (11).

HOVSEPIAN, P. E., EHIASARIAN, A. P., DEEMING, A. and SCHIMPF, C. (2008). Novel TiAlCN/VCN nanoscale multilayer PVD coatings deposited by the combined high-power impulse magnetron sputtering/unbalanced magnetron sputtering (HIPIMS/UBM) technology. Vacuum, 82 (11), 1312-1317.

ANDERSSON, J., EHIASARIAN, A. P. and ANDERS, A. (2008). Observation of Ti4+ ions in a high power impulse magnetron sputtering plasma. Applied Physics Letters, 93 (7).

ANDERSSON, Joakim, EHIASARIAN, Arutiun and ANDERS, Andre (2008). Observation of Ti4+ ions in a high power impulse magnetron sputtering plasma. Applied Physics Letters, 93, 071504.

HECIMOVIC, A., BURCALOVA, K. and EHIASARIAN, A. P. (2008). Origins of ion energy distribution function (IEDF) in high power impulse magnetron sputtering (HIPIMS) plasma discharge. Journal of Physics D: Applied Physics, 41 (9).

VETUSHKA, A. and EHIASARIAN, A. P. (2008). Plasma dynamic in chromium and titanium HIPIMS discharges. Journal of Physics D: Applied Physics, 41 (1).

EHIASARIAN, Arutiun, GONZALVO, Yolanda Aranda and WHITMORE, Terry D. (2007). Time-resolved ionisation studies of the high power impulse magnetron discharge in mixed argon and nitrogen atmosphere. Plasma Processes and Polymers, 4 (1), S309-S313.

EHIASARIAN, Arutiun, PETROV, I. and WEN, J. G. (2007). Interface microstructure engineering by high power impulse magnetron sputtering for the enhancement of adhesion. Journal of applied physics, 101 (5), 054301-1.

EHIASARIAN, A. P., ANDERS, A. and PETROV, I. (2007). Combined filtered cathodic arc etching pretreatment-magnetron sputter deposition of highly adherent CrN films. Journal of Vacuum Science & Technology A, 25 (3), 543-550.

REINHARD, C., EHIASARIAN, A. P. and HOVSEPIAN, P. E. (2007). CrN/NbN superlattice structured coatings with enhanced corrosion resistance achieved by high power impulse magnetron sputtering interface pre-treatment. Thin Solid Films, 515 (7-8), 3685-3692.

ANDERS, A., ANDERSSON, J. and EHIASARIAN, A. P. (2007). High power impulse magnetron sputtering: Current-voltage-time characteristics indicate the onset of sustained self-sputtering. Journal of Applied Physics, 102 (11).

EHIASARIAN, A. P., WEN, J. G. and PETROV, I. (2007). Interface microstructure engineering by high power impulse magnetron sputtering for the enhancement of adhesion. Journal of Applied Physics, 101.

LUO, Q., SCHIMPF, C., EHIASARIAN, A. P., CHEN, L. and HOVSEPIAN, P. (2007). Structure and wear mechanisms of nano-structured TiAlCN/VCN multilayer coatings. Plasma Process and Polymers, 4, S916-S920.

HOVSEPIAN, P. E., REINHARD, C. and EHIASARIAN, A. P. (2006). CrAlYN/CrN superlattice coatings deposited by the combined high power impulse magnetron sputtering/unbalanced magnetron sputtering technique. Surface and Coatings Technology, 201 (7), 4105-4110.

LATTEMANN, M., EHIASARIAN, A. P., BOHMARK, J., PERSSON, P. A. O. and HELMERSSON, U. (2006). Investigation of high power impulse magnetron sputtering pretreated interfaces for adhesion enhancement of hard coatings on steel. Surface and Coatings Technology, 200 (22-23), 6495-6499.

HELMERSSON, U., LATTEMANN, M., BOHLMARK, J., EHIASARIAN, A. P. and GUDMUNDSSON, J. T. (2006). Ionized physical vapor deposition (IPVD): A review of technology and applications. Thin Solid Films, 513 (1-2), 1-24.

VAN ESSEN, P., HOY, R., KAMMING, J. D., EHIASARIAN, A. P. and JANSSEN, G. (2006). Scratch resistance and wear of CrNx coatings. Surface and Coatings Technology, 200 (11), 3496-3502.

BOHLMARK, J., LATTEMANN, M., GUDMUNDSSON, J. T., EHIASARIAN, A. P., GONZALVO, Y. A., BRENNING, N. and HELMERSSON, U. (2006). The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge. Thin Solid Films, 515 (4), 1522-1526.

LEWIS, D. B., CREASEY, S. J., WUSTEFELD, C., EHIASARIAN, A. P. and HOVSEPIAN, P. E. (2006). The role of the growth defects on the corrosion resistance of CrN/NbN superlattice coatings deposited at low temperatures. Thin Solid Films, 503 (1-2), 143-148.

HOVSEPIAN, Papken, KOK, Y. N., EHIASARIAN, Arutiun and HAASCH, R. (2005). Phase separation and formation of the self-organised nanostructure in C/Cr coatings in conditions of high ion irradiation. Surface and coatings technology, 5-6.

EHIASARIAN, Arutiun, HOVSEPIAN, Papken, NEW, Roger and VALTER, J. (2005). Influence of steering magnetic field on the time-resolved plasma chemistry in cathodic arc discharges. In: XXIst International Symposium on Discharges and Electrical Insulation in Vacuum, 2004. Proceedings. ISDEIV. Proceedings - International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV, 2 (685). Institute of Electrical and Electronics Engineers Inc., 521-524.

BOHLMARK, J., ALAMI, J., CHRISTOU, C., EHIASARIAN, A. P. and HELMERSSON, U. (2005). Ionization of sputtered metals in high power pulsed magnetron sputtering. Journal of Vacuum Science & Technology A, 23 (1), 18-22.

EHIASARIAN, Arutiun, HOVSEPIAN, Papken, HULTMAN, L. and HELMERSSON, U. (2004). Comparison of microstructure and mechanical properties of chromium nitride-based coatings deposited by high power impulse magnetron sputtering and by the combined steered cathodic arc/unbalanced magnetron technique. Thin solid films, 457 (2), 270-277.

ZHOU, Z. X., RAINFORTH, W. M., ROTHER, B., EHIASARIAN, A. P., HOVSEPIAN, P. E. and MUNZ, W. D. (2004). Elemental distributions and substrate rotation in industrial TiAlN/VN superlattice hard PVD coatings. Surface and Coatings Technology, 183 (2-3), 275-282.

EHIASARIAN, A. P., HOVSEPIAN, P. E., NEW, R. and VALTER, J. (2004). Influence of steering magnetic field on the time-resolved plasma chemistry in cathodic arc discharges. Journal of Physics D: Applied Physics, 37 (15), 2101-2106.

ZHOU, Z., RAINFORTH, W. M., LEWIS, D. B., CREASY, S., FORSYTH, J. J., CLEGG, E., EHIASARIAN, A. P., HOVSEPIAN, P. E. and MUNZ, W. D. (2004). Oxidation behaviour of nanoscale TiAlN/VN multilayer coatings. Surface and Coatings Technology, 177, 198-203.

HOY, R., VAN ESSEN, P., KAMMINGA, J. D., JANSSEN, G. C. A. M. and EHIASARIAN, Arutiun (2004). Scratch test measurements on CrNx coatings. In: COCORAN, Sean G., JOO, Y.-C., MOODY, N.R. and SUO, Z., (eds.) Thin Films: Stresses and Mechanical Properties X ; proceedings. Materials Research Society symposium proceedings (795). Materials Research Society, 491-496.

HOVSEPIAN, P. E., KOK, Y. N., EHIASARIAN, A. P., ERDEMIR, A., WEN, J. G. and PETROV, I. (2004). Structure and tribological behaviour of nanoscale multilayer C/Cr coatings deposited by the combined steered cathodic arc/unbalanced magnetron sputtering technique. Thin Solid Films, 447, 7-13.

LEWIS, D. B., CREASEY, S. J., ZHOU, Z., FORSYTH, J. J., EHIASARIAN, A. P., HOVSEPIAN, P. E., LUO, Q., RAINFORTH, W. M. and MUNZ, W. D. (2004). The effect of (Ti + Al): V ratio on the structure and oxidation behaviour of TiAlN/VN nano-scale multilayer coatings. Surface and Coatings Technology, 177, 252-259.

EHIASARIAN, Arutiun, MUNZ, W. D., HULTMAN, L., HELMERSSON, U. and PETROV, I. (2003). High power pulsed magnetron sputtered CrNx films. Surface and coatings technology, 163-164, 267-272.

EHIASARIAN, Arutiun, MUNZ, W. D., HULTMAN, L., HELMERSSON, U., PETROV, I. and SEITZ, Frederick (2003). High power pulsed magnetron sputtered CrNx films. Galvanotechnik, 94 (6), 1480-1487.

EHIASARIAN, A., NEW, R., MUNZ, W. D., HULTMAN, L., HELMERSSON, U. and KOUZNETSOV, V. (2002). Influence of high power densities on the composition of pulsed magnetron plasmas. Vacuum, 65, 147-154.

EHIASARIAN, Arutiun, NEW, Roger, MUNZ, W. D., HULTMAN, L., HELMERSSON, U. and KOUZNETSOV, V. (2001). Influence of high power densities on the composition of pulsed magnetron plasmas. Vacuum, 65 (2), 147-154.

EHIASARIAN, Arutiun, MACAK, K. A., SCHONJAHN, C., NEW, Roger and MUNZ, W. D. (2001). Characterization of arc discharge plasmas in the combined steered arc/unbalanced magnetron deposition process. Annual Technical Conference of the Society of Vacuum Coaters. Proceedings., 44, 382-387.

MUNZ, W. D., LEWIS, D. B., HOVSEPIAN, P. E., SCHONJAHN, C., EHIASARIAN, A. P. and SMITH, I. J. (2001). Industrial scale manufactured superlattice hard PVD coatings. Surface Engineering, 17 (1), 15-27.

SCHONJAHN, C., EHIASARIAN, Arutiun, LEWIS, D. B., NEW, R., MUNZ, W. D., TWESTEN, R. D. and PETROV, I. (2001). Optimization of in situ substrate surface treatment in a cathodic arc plasma: A study by TEM and plasma diagnostics. Journal of Vacuum Science & Technology A, 19 (4), 1415-1420.

NAYAL, G., EHIASARIAN, A. P., MACAK, K. M., NEW, R., MUNZ, W. D. and SMITH, I. J. (2001). A new low pressure plasma nitriding and PVD coating duplex treatment of HSS substrates. In: Progress in plasma processing of materials 2001. Begell House, 565-572.

This list was generated on Sat Jul 26 09:13:49 2014 IST.