EVANGELOU, E. K., WIEMER, C., FANCIULLI, M., SETHU, M. and CRANTON, Wayne (2003). Electrical and structural characteristics of yttrium oxide films deposited by rf-magnetron sputtering on n-Si. Journal of Applied Physics, 94 (1), 318-325.
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Official URL: http://scitation.aip.org/content/aip/journal/jap/9...
Link to published version:: https://doi.org/10.1063/1.1580644
Item Type: | Article |
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Additional Information: | Cited By (since 1996):42 ID=184 |
Research Institute, Centre or Group - Does NOT include content added after October 2018: | Materials and Engineering Research Institute > Engineering Research Materials and Engineering Research Institute > Advanced Coatings and Composites Research Centre > Electronic Materials and Sensors Research Group |
Identification Number: | https://doi.org/10.1063/1.1580644 |
Page Range: | 318-325 |
Depositing User: | Wayne Cranton |
Date Deposited: | 01 Jun 2016 12:43 |
Last Modified: | 18 Mar 2021 19:15 |
URI: | https://shura.shu.ac.uk/id/eprint/8013 |
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