Electrical and structural characteristics of yttrium oxide films deposited by rf-magnetron sputtering on n-Si

EVANGELOU, E. K., WIEMER, C., FANCIULLI, M., SETHU, M. and CRANTON, Wayne (2003). Electrical and structural characteristics of yttrium oxide films deposited by rf-magnetron sputtering on n-Si. Journal of Applied Physics, 94 (1), 318-325.

Full text not available from this repository. (Contact the author)
Official URL: http://scitation.aip.org/content/aip/journal/jap/9...
Link to published version:: https://doi.org/10.1063/1.1580644
Item Type: Article
Additional Information: Cited By (since 1996):42 ID=184
Research Institute, Centre or Group - Does NOT include content added after October 2018: Materials and Engineering Research Institute > Engineering Research
Materials and Engineering Research Institute > Advanced Coatings and Composites Research Centre > Electronic Materials and Sensors Research Group
Identification Number: https://doi.org/10.1063/1.1580644
Page Range: 318-325
Depositing User: Wayne Cranton
Date Deposited: 01 Jun 2016 12:43
Last Modified: 18 Mar 2021 19:15
URI: https://shura.shu.ac.uk/id/eprint/8013

Actions (login required)

View Item View Item

Downloads

Downloads per month over past year

View more statistics